This review highlights the most significant advances of the nanofabrication techniques
reported over the past decade with a particular focus on the approaches tailored towards the …

Releasing the potential of advanced material properties by controlled structuring materials
on sub-100-nm length scales for applications such as integrated circuits, nano …

Nanoimprint lithography, a high‐throughput, low‐cost, nonconventional lithographic method
proposed and demonstrated recently, has been developed and investigated further …

In this article, a novel surface plasmon polariton-based plasmonic refractive index sensor is
proposed and numerically investigated. It consists of a structure of an octagonal cavity …

For all technologies, from flint arrowheads to DNA microarrays, patterning the functional
material is crucial. For semiconductor integrated circuits (ICs), it is even more critical than for …

We demonstrate wide-area fabrication of sub-40 nm diameter, 1.5 µm tall, high aspect ratio
silicon pillar arrays with straight sidewalls by combining nanoimprint lithography (NIL) and …

Optofluidics is an emerging field that involves the use of fluids to modify optical properties
and the use of optical devices to detect flowing media. Ultimately, its value is highly …

Nanostructured ferroelectric patterns are promising for a wide range of applications,
including sensing and actuation, data storage, photonics, spintronics, and energy …

The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale
patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike …

Future NASA X-ray spectroscopy missions will require high throughput, high resolving
power grating spectrometers. Off-plane reflection gratings are capable of meeting the …