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Structural properties of self-organized semiconductor nanostructures
J Stangl, V Holý, G Bauer - Reviews of modern physics, 2004 - APS
Instabilities in semiconductor heterostructure growth can be exploited for the self-organized
formation of nanostructures, allowing for carrier confinement in all three spatial dimensions …
formation of nanostructures, allowing for carrier confinement in all three spatial dimensions …
Crystal surfaces in and out of equilibrium: A modern view
C Misbah, O Pierre-Louis, Y Saito - Reviews of Modern Physics, 2010 - APS
The last two decades of progress in the theory of crystal surfaces in and out of equilibrium is
reviewed. Various instabilities that occur during growth and sublimation, or that are caused …
reviewed. Various instabilities that occur during growth and sublimation, or that are caused …
[Књига][B] Islands, mounds and atoms
Crystal growth far from thermodynamic equilibrium is nothing but homoepitaxy-thin film
growth on a crystalline substrate of the same material. Because of the absence of misfit …
growth on a crystalline substrate of the same material. Because of the absence of misfit …
Adatom and nanoparticle dynamics on single-atom catalyst substrates
Single-atom catalysts represent an essential and ever-growing family of heterogeneous
catalysts. Recent studies indicate that besides the valuable catalytic properties provided by …
catalysts. Recent studies indicate that besides the valuable catalytic properties provided by …
Nucleation-related defect-free GaP/Si (100) heteroepitaxy via metal-organic chemical vapor deposition
GaP/Si heterostructures were grown by metal-organic chemical vapor deposition in which
the formation of all heterovalent nucleation-related defects (antiphase domains, stacking …
the formation of all heterovalent nucleation-related defects (antiphase domains, stacking …
SiGe nanostructures
I Berbezier, A Ronda - Surface Science Reports, 2009 - Elsevier
Since the first studies in the late 1970s most of the researches on Si1− xGex nanostructures
have been motivated by their potential applications in micro, opto and nanoelectronic …
have been motivated by their potential applications in micro, opto and nanoelectronic …
Spin read-out in atomic qubits in an all-epitaxial three-dimensional transistor
The realization of the surface code for topological error correction is an essential step
towards a universal quantum computer,–. For single-atom qubits in silicon,,–, the need to …
towards a universal quantum computer,–. For single-atom qubits in silicon,,–, the need to …
Effects of interface steps on the valley-orbit coupling in a Si/SiGe quantum dot
B Tariq, X Hu - Physical Review B, 2019 - APS
Valley-orbit coupling is a key parameter for a silicon quantum dot in determining its
suitability for applications in quantum information processing. In this paper we study the …
suitability for applications in quantum information processing. In this paper we study the …
Positioning of self-assembled Ge islands on stripe-patterned Si (001) substrates
Z Zhong, A Halilovic, M Mühlberger… - Journal of Applied …, 2003 - pubs.aip.org
Self-assembled Ge islands were grown on stripe-patterned Si (001) substrates by solid
source molecular beam epitaxy. The surface morphology obtained by atomic force …
source molecular beam epitaxy. The surface morphology obtained by atomic force …
Scaling properties of step bunches induced by sublimation and related mechanisms
This work provides a ground for a quantitative interpretation of experiments on step
bunching during sublimation of crystals with a pronounced Ehrlich-Schwoebel (ES) barrier …
bunching during sublimation of crystals with a pronounced Ehrlich-Schwoebel (ES) barrier …