This is a topical review on advanced lithographic methods used to create 3D topographies.
We start the discussion with the principal capabilities of grayscale electron beam lithography …

Two-dimensional (2D) semiconductors possess promise for the development of field-effect
transistors (FETs) at the ultimate scaling limit due to their strong gate electrostatics …

Integrated photonic devices in diamond have tremendous potential for many quantum
applications, including long-distance quantum communication, quantum information …

Topological qubits based on Majorana Fermions have the potential to revolutionize the
emerging field of quantum computing by making information processing significantly more …

Abstract Electron Beam Lithography (EBL) is a fundamental technique of nanofabrication,
allowing not only the direct writing of structures down to sub-10 nm dimensions, but also …

We present a novel shadow evaporation technique for the realization of junctions and
capacitors. The design by e-beam lithography of strongly asymmetric undercuts on a bilayer …

Determining the lithographic process conditions with high-resolution patterning plays a
crucial role in accelerating chip manufacturing. However, lithography imaging is an …

A scanning-helium-ion-beam microscope is now commercially available. This microscope
can be used to perform lithography similar to, but of potentially higher resolution than …

The high-volume production of semiconductor devices with EUV lithography started in 2019.
During the development of EUV lithography, the resist materials had always been ranked …

A major challenge in nanofabrication is to pattern unconventional substrates that cannot be
processed for a variety of reasons, such as incompatibility with spin coating, electron beam …