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A surface code quantum computer in silicon
The exceptionally long quantum coherence times of phosphorus donor nuclear spin qubits
in silicon, coupled with the proven scalability of silicon-based nano-electronics, make them …
in silicon, coupled with the proven scalability of silicon-based nano-electronics, make them …
Momentum‐Space Imaging of Ultra‐Thin Electron Liquids in δ‐Doped Silicon
Two‐dimensional dopant layers (δ‐layers) in semiconductors provide the high‐mobility
electron liquids (2DELs) needed for nanoscale quantum‐electronic devices. Key parameters …
electron liquids (2DELs) needed for nanoscale quantum‐electronic devices. Key parameters …
Ab initio calculation of energy levels for phosphorus donors in silicon
The s manifold energy levels for phosphorus donors in silicon are important input
parameters for the design and modeling of electronic devices on the nanoscale. In this …
parameters for the design and modeling of electronic devices on the nanoscale. In this …
Observation and origin of the manifold in Si:P layers
By creating a sharp and dense dopant profile of phosphorus atoms buried within a silicon
host, a two-dimensional electron gas is formed within the dopant region. Quantum …
host, a two-dimensional electron gas is formed within the dopant region. Quantum …
The sub-band structure of atomically sharp dopant profiles in silicon
The downscaling of silicon-based structures and proto-devices has now reached the single-
atom scale, representing an important milestone for the development of a silicon-based …
atom scale, representing an important milestone for the development of a silicon-based …
Asymmetric GaAs n-type double δ-doped quantum wells as a source of intersubband-related nonlinear optical response: Effects of an applied electric field
In this work, the conduction band electron states and the associated intersubband-related
linear and nonlinear optical absorption coefficient and relative refractive index change are …
linear and nonlinear optical absorption coefficient and relative refractive index change are …
[HTML][HTML] Electronic structure of boron and aluminum δ-doped layers in silicon
Recent work on atomic-precision dopant incorporation technologies has led to the creation
of both boron and aluminum δ-doped layers in silicon with densities above the solid …
of both boron and aluminum δ-doped layers in silicon with densities above the solid …
Valley splitting in a silicon quantum device platform
By suppressing an undesirable surface Umklapp process, it is possible to resolve the two
most occupied states (1Γ and 2Γ) in a buried two-dimensional electron gas (2DEG) in …
most occupied states (1Γ and 2Γ) in a buried two-dimensional electron gas (2DEG) in …
Delta Do** in Silicon by Argon Ion Preimplantation and Nanosecond Laser Annealing
Z Fan, Y Liu, Y Wang, W Song, H Wei… - ACS Applied …, 2025 - ACS Publications
Delta do** (δ-do**) has extensive applications in advanced metal oxide semiconductor
field effect transistors, quantum devices, and deep ultraviolet (DUV) photodetectors. In this …
field effect transistors, quantum devices, and deep ultraviolet (DUV) photodetectors. In this …
Simulated do** of Si from first principles using pseudoatoms
Semiconductor do** is a process of fundamental importance to semiconductor physics
and solid-state electronics, but cannot be explicitly simulated from first principles due to the …
and solid-state electronics, but cannot be explicitly simulated from first principles due to the …