A surface code quantum computer in silicon

CD Hill, E Peretz, SJ Hile, MG House, M Fuechsle… - Science …, 2015 - science.org
The exceptionally long quantum coherence times of phosphorus donor nuclear spin qubits
in silicon, coupled with the proven scalability of silicon-based nano-electronics, make them …

Momentum‐Space Imaging of Ultra‐Thin Electron Liquids in δ‐Doped Silicon

P Constantinou, TJZ Stock, E Crane, A Kölker… - Advanced …, 2023 - Wiley Online Library
Two‐dimensional dopant layers (δ‐layers) in semiconductors provide the high‐mobility
electron liquids (2DELs) needed for nanoscale quantum‐electronic devices. Key parameters …

Ab initio calculation of energy levels for phosphorus donors in silicon

JS Smith, A Budi, MC Per, N Vogt, DW Drumm… - Scientific reports, 2017 - nature.com
The s manifold energy levels for phosphorus donors in silicon are important input
parameters for the design and modeling of electronic devices on the nanoscale. In this …

Observation and origin of the manifold in Si:P layers

AJ Holt, SK Mahatha, RM Stan, FS Strand, T Nyborg… - Physical Review B, 2020 - APS
By creating a sharp and dense dopant profile of phosphorus atoms buried within a silicon
host, a two-dimensional electron gas is formed within the dopant region. Quantum …

The sub-band structure of atomically sharp dopant profiles in silicon

F Mazzola, CY Chen, R Rahman, XG Zhu… - npj Quantum …, 2020 - nature.com
The downscaling of silicon-based structures and proto-devices has now reached the single-
atom scale, representing an important milestone for the development of a silicon-based …

Asymmetric GaAs n-type double δ-doped quantum wells as a source of intersubband-related nonlinear optical response: Effects of an applied electric field

KA Rodríguez-Magdaleno, JC Martínez-Orozco… - Journal of …, 2014 - Elsevier
In this work, the conduction band electron states and the associated intersubband-related
linear and nonlinear optical absorption coefficient and relative refractive index change are …

[HTML][HTML] Electronic structure of boron and aluminum δ-doped layers in silicon

QT Campbell, S Misra, AD Baczewski - Journal of Applied Physics, 2023 - pubs.aip.org
Recent work on atomic-precision dopant incorporation technologies has led to the creation
of both boron and aluminum δ-doped layers in silicon with densities above the solid …

Valley splitting in a silicon quantum device platform

JA Miwa, O Warschkow, DJ Carter, NA Marks… - Nano …, 2014 - ACS Publications
By suppressing an undesirable surface Umklapp process, it is possible to resolve the two
most occupied states (1Γ and 2Γ) in a buried two-dimensional electron gas (2DEG) in …

Delta Do** in Silicon by Argon Ion Preimplantation and Nanosecond Laser Annealing

Z Fan, Y Liu, Y Wang, W Song, H Wei… - ACS Applied …, 2025 - ACS Publications
Delta do** (δ-do**) has extensive applications in advanced metal oxide semiconductor
field effect transistors, quantum devices, and deep ultraviolet (DUV) photodetectors. In this …

Simulated do** of Si from first principles using pseudoatoms

O Sinai, L Kronik - Physical Review B—Condensed Matter and Materials …, 2013 - APS
Semiconductor do** is a process of fundamental importance to semiconductor physics
and solid-state electronics, but cannot be explicitly simulated from first principles due to the …