Geometry dependence of total-dose effects in bulk FinFETs

I Chatterjee, EX Zhang, BL Bhuva… - … on Nuclear Science, 2014 - ieeexplore.ieee.org
<? Pub Dtl=""?> The total ionizing dose (TID) response of bulk FinFETs is investigated for
various geometry variations, such as fin width, channel length, and fin pitch. The buildup of …

Control electronics for semiconductor spin qubits

L Geck, A Kruth, H Bluhm, S van Waasen… - Quantum science and …, 2019 - iopscience.iop.org
Future universal quantum computers solving problems of practical relevance are expected
to require at least 10 6 qubits, which is a massive scale-up from the present numbers of less …

Band-to-band tunneling (BBT) induced leakage current enhancement in irradiated fully depleted SOI devices

PC Adell, HJ Barnaby, RD Schrimpf… - IEEE Transactions on …, 2007 - ieeexplore.ieee.org
We propose a model, validated with simulations, describing how band-to-band tunneling
(BBT) affects the leakage current degradation in some irradiated fully-depleted SOI devices …

Comparison of total-ionizing-dose effects in bulk and SOI FinFETs at 90 and 295 K

TD Haeffner, RF Keller, R Jiang… - … on Nuclear Science, 2019 - ieeexplore.ieee.org
Bulk and silicon-on-insulator (SOI) n-channel FinFETs with fin widths of 15-40 nm and
channel lengths of 45 and 1000 nm were irradiated with 1.8 MeV protons at temperatures of …

Total dose effects in CMOS trench isolation regions

AH Johnston, RT Swimm, GR Allen… - IEEE Transactions on …, 2009 - ieeexplore.ieee.org
A model for inversion in trench isolation is developed using an analytical model to calculate
the surface charge density along the trench sidewall. The model shows that the inversion …

An evaluation of transistor-layout RHBD techniques for SEE mitigation in SiGe HBTs

AK Sutton, M Bellini, JD Cressler… - … on Nuclear Science, 2007 - ieeexplore.ieee.org
We investigate transistor-level layout-based techniques for SEE mitigation in advanced SiGe
HBTs. The approach is based on the inclusion of an alternate reverse-biased pn junction (n …

Time-Domain Reflectometry Measurements of Total-Ionizing-Dose Degradation of MOSFETs

EX Zhang, DM Fleetwood, ND Pate… - … on Nuclear Science, 2013 - ieeexplore.ieee.org
We have performed time-domain reflectometry (TDR) measurements on nMOSFETs before
and after irradiation on time scales relevant to MOS radio-frequency response. The …

Physics-based modeling of TID induced global static leakage in different CMOS circuits

GI Zebrev, VV Orlov, MS Gorbunov… - Microelectronics …, 2018 - Elsevier
Compact modeling of inter-device radiation-induced leakage underneath the gateless thick
STI oxide is presented and validated taking into account CMOS technology and hardness …

Low dose rate effects in shallow trench isolation regions

AH Johnston, RT Swimm… - IEEE Transactions on …, 2010 - ieeexplore.ieee.org
Dose-rate effects are studied in shallow trench isolation regions. Increased damage is
observed at low dose rate, with a different dose dependence compared to tests done at high …

Characteristics of 22 nm UTBB-FDSOI technology with an ultra-wide temperature range

H Wang, J Bi, J Bu, H Liu, F Zhao… - Semiconductor Science …, 2022 - iopscience.iop.org
The performance of the ultra-thin body and buried oxide fully-depleted silicon-on-insulator
metal-oxide-semiconductor field-effect-transistors based on a 22 nm technology node is …