This paper compares electrical, optical, and atomic force microscope (AFM) measurements
of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable …

The standard approach to generate the data required for automated proximity correction is to
measure a set of patterned features using an optical tool or a critical dimension scanning …

This paper describes the design and measurement of electrically measured test structures
for the characterisation of dimensional mismatch in an advanced photomask making …

Simple electrical test structures have been designed that will allow the characterisation of
corner serif forms of optical proximity correction. The structures measure the resistance of a …

This paper reports the measurement results from a set of electrical, on-mask test structures
based on industry standard test feature layouts normally used to investigate process …

This paper presents results from the use of electrical measurements to investigate
dimensional mismatch in an advanced photomask process. Test structures consisting of …

This paper presents a comparison of optical and electrical techniques for critical dimension
(CD) metrology on binary and alternating aperture phase-shifting masks. Measurements …

This paper compares electrical, optical and AFM measurements of critical dimension (CD)
made on a chrome on quartz photomask. Test structures suitable for direct, on-mask …

The technical objective of the work reported here is to assess whether radio-frequency (RF)
measurements made on coplanar waveguide (CPW) test structures, which are replicated in …

Existing photomask metrology is struggling to keep pace with the rapid reduction of IC
dimensions as traditional measurement techniques are being stretched to their limits. This …