Nanomanufacturing—Perspective and applications

FZ Fang, XD Zhang, W Gao, YB Guo, G Byrne… - CIRP Annals, 2017 - Elsevier
Nanomanufacturing involves scaled-up, reliable, and cost-effective manufacturing of
nanoscale materials, structures, devices, and systems. Nanomanufacturing methods can be …

Map** and imaging of thin films on large surfaces

P Petrik, M Fried - physica status solidi (a), 2022 - Wiley Online Library
Thin films covering large surfaces are used in a very wide range of applications from
displays through corrosion resistance, decoration, water proofing, smart windows, adhesion …

Metrology of nanoscale grating structures by UV scatterometry

M Wurm, J Endres, J Probst, M Schoengen, A Diener… - Optics express, 2017 - opg.optica.org
In this contribution we demonstrate goniometric scatterometry measurements of gratings
with linewidths down to 25 nm on silicon wafers with an inspection wavelength of 266 nm …

Transversal optical singularity induced precision measurement of step-nanostructures

X Dou, J Zhou, Y Zhang, C Min, SF Pereira, X Yuan - Optics Express, 2023 - opg.optica.org
Optical singularities indicate zero-intensity points in space where parameters, such as
phase, polarization, are undetermined. Vortex beams such as the Laguerre–Gaussian …

Inverse scattering with a parametrized spatial spectral volume integral equation for finite scatterers

S Eijsvogel, RJ Dilz, MC van Beurden - JOSA A, 2023 - opg.optica.org
In wafer metrology, the knowledge of the photomask together with the deposition process
only reveals the approximate geometry and material properties of the structures on a wafer …

Bayesian Target‐Vector Optimization for Efficient Parameter Reconstruction

M Plock, K Andrle, S Burger… - Advanced Theory and …, 2022 - Wiley Online Library
Parameter reconstructions are indispensable in metrology. Here, the objective is to explain
K experimental measurements by fitting to them a parameterized model of the measurement …

Simultaneous measurement of multiple parameters of a subwavelength structure based on the weak value formalism

A Vella, ST Head, TG Brown, MA Alonso - Physical Review Letters, 2019 - APS
A mathematical extension of the weak value formalism to the simultaneous measurement of
multiple parameters is presented in the context of an optical focused vector beam …

The digital transformation and novel calibration approaches

G Kok - tm-Technisches Messen, 2022 - degruyter.com
In this paper we describe how the digital transformation (ie, the adoption of digital
technology) of society affects National Metrology Institutes like VSL. This digital …

Coherent Fourier scatterometry: a holistic tool for inspection of isolated particles or defects on gratings

A Paul, D Kolenov, T Scholte, SF Pereira - Applied Optics, 2023 - opg.optica.org
Detecting defects on diffraction gratings is crucial for ensuring their performance and
reliability. Practical detection of these defects poses challenges due to their subtle nature …

Automatic feature selection in EUV scatterometry

P Ansuinelli, WMJ Coene, HP Urbach - Applied Optics, 2019 - opg.optica.org
Scatterometry is an important nonimaging and noncontact method for optical metrology. In
scatterometry certain parameters of interest are determined by solving an inverse problem …