Nanomanufacturing—Perspective and applications
Nanomanufacturing involves scaled-up, reliable, and cost-effective manufacturing of
nanoscale materials, structures, devices, and systems. Nanomanufacturing methods can be …
nanoscale materials, structures, devices, and systems. Nanomanufacturing methods can be …
Map** and imaging of thin films on large surfaces
Thin films covering large surfaces are used in a very wide range of applications from
displays through corrosion resistance, decoration, water proofing, smart windows, adhesion …
displays through corrosion resistance, decoration, water proofing, smart windows, adhesion …
Metrology of nanoscale grating structures by UV scatterometry
M Wurm, J Endres, J Probst, M Schoengen, A Diener… - Optics express, 2017 - opg.optica.org
In this contribution we demonstrate goniometric scatterometry measurements of gratings
with linewidths down to 25 nm on silicon wafers with an inspection wavelength of 266 nm …
with linewidths down to 25 nm on silicon wafers with an inspection wavelength of 266 nm …
Transversal optical singularity induced precision measurement of step-nanostructures
Optical singularities indicate zero-intensity points in space where parameters, such as
phase, polarization, are undetermined. Vortex beams such as the Laguerre–Gaussian …
phase, polarization, are undetermined. Vortex beams such as the Laguerre–Gaussian …
Inverse scattering with a parametrized spatial spectral volume integral equation for finite scatterers
S Eijsvogel, RJ Dilz, MC van Beurden - JOSA A, 2023 - opg.optica.org
In wafer metrology, the knowledge of the photomask together with the deposition process
only reveals the approximate geometry and material properties of the structures on a wafer …
only reveals the approximate geometry and material properties of the structures on a wafer …
Bayesian Target‐Vector Optimization for Efficient Parameter Reconstruction
M Plock, K Andrle, S Burger… - Advanced Theory and …, 2022 - Wiley Online Library
Parameter reconstructions are indispensable in metrology. Here, the objective is to explain
K experimental measurements by fitting to them a parameterized model of the measurement …
K experimental measurements by fitting to them a parameterized model of the measurement …
Simultaneous measurement of multiple parameters of a subwavelength structure based on the weak value formalism
A mathematical extension of the weak value formalism to the simultaneous measurement of
multiple parameters is presented in the context of an optical focused vector beam …
multiple parameters is presented in the context of an optical focused vector beam …
The digital transformation and novel calibration approaches
G Kok - tm-Technisches Messen, 2022 - degruyter.com
In this paper we describe how the digital transformation (ie, the adoption of digital
technology) of society affects National Metrology Institutes like VSL. This digital …
technology) of society affects National Metrology Institutes like VSL. This digital …
Coherent Fourier scatterometry: a holistic tool for inspection of isolated particles or defects on gratings
Detecting defects on diffraction gratings is crucial for ensuring their performance and
reliability. Practical detection of these defects poses challenges due to their subtle nature …
reliability. Practical detection of these defects poses challenges due to their subtle nature …
Automatic feature selection in EUV scatterometry
P Ansuinelli, WMJ Coene, HP Urbach - Applied Optics, 2019 - opg.optica.org
Scatterometry is an important nonimaging and noncontact method for optical metrology. In
scatterometry certain parameters of interest are determined by solving an inverse problem …
scatterometry certain parameters of interest are determined by solving an inverse problem …