The status and perspectives of nanostructured materials and fabrication processes for wearable piezoresistive sensors

W Chiappim, MA Fraga, H Furlan, DC Ardiles… - Microsystem …, 2022 - Springer
The wearable sensors have attracted a growing interest in different markets, including
health, fitness, gaming, and entertainment, due to their outstanding characteristics of …

Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature

A Jolivet, C Labbé, C Frilay, O Debieu, P Marie… - Applied Surface …, 2023 - Elsevier
TiO 2 films were deposited by ALD on Si and glass substrates. FTIR analysis reveals an
incomplete process for deposition temperatures below 160° C. The transition from the …

Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

W Chiappim, BB Neto, M Shiotani, J Karnopp… - Nanomaterials, 2022 - mdpi.com
The growing need for increasingly miniaturized devices has placed high importance and
demands on nanofabrication technologies with high-quality, low temperatures, and low-cost …

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

PS Padhi, RS Ajimsha, SK Rai, S Bhartiya… - Journal of Vacuum …, 2023 - pubs.aip.org
Considering the potential applications of Al 2 O 3/TiO 2 nanolaminates (ATA NLs) in storage
capacitors, device-grade ATA NLs are fabricated using an ALD system, wherein the effect of …

Thermionic Emission of Atomic Layer Deposited MoO3/Si UV Photodetectors

MA Basyooni, AEH Gaballah, M Tihtih, I Derkaoui… - Materials, 2023 - mdpi.com
Ultrathin MoO3 semiconductor nanostructures have garnered significant interest as a
promising nanomaterial for transparent nano-and optoelectronics, owing to their exceptional …

Surface modification of Ti6Al7Nb alloy by Al2O3 nanofilms and calcium phosphate coatings

LMR de Sousa, M das Virgens Santana… - Surface and Coatings …, 2023 - Elsevier
Here we have modified Ti6Al7Nb alloy by Al 2 O 3 using Atomic Layer Deposition (ALD) and
apatite coating electrodeposited and by Simulated Body Fluid method. X-Ray Fluorescence …

Understanding and utilizing reactive oxygen reservoirs in atomic layer deposition of metal oxides with ozone

JR Schneider, C de Paula, NE Richey… - Chemistry of …, 2022 - ACS Publications
Contrary to idealized depictions, atomic layer deposition (ALD) reactions do not always take
place solely at the gas–solid interface. The iron oxide ALD system was recently shown to …

[HTML][HTML] Effect of plasma-enhanced atomic layer deposition on oxygen overabundance and its influence on the morphological, optical, structural, and mechanical …

W Chiappim, G Testoni, F Miranda, M Fraga, H Furlan… - Micromachines, 2021 - mdpi.com
The chemical, structural, morphological, and optical properties of Al-doped TiO2 thin films,
called TiO2/Al2O3 nanolaminates, grown by plasma-enhanced atomic layer deposition …

Area-selective atomic layer deposition (AS-ALD) of low temperature (300° C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs …

C Kim, M Choi, J Sim, H Kim, C Choi - Applied Surface Science, 2024 - Elsevier
As the semiconductor industry advances, manufacturing technologies encounter challenges
in achieving precise alignment and thickness control with smaller and more intricate 3D …

In-situ crystallization of rutile-phased TiO2 via the template effect using MoO2 electrode for the metal-insulator-metal capacitor applications

C Hwang, YW Kim, J Park, MH Kim, JS Kim… - Journal of Alloys and …, 2024 - Elsevier
This study investigates the viability of TiO 2 as a high-k material in metal-insulator-metal
(MIM) capacitors, essential components influencing semiconductor memory device …