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US8064044B2 - Exposure apparatus, exposure method, and device producing method -
Google Patents US8064044B2 - Exposure apparatus, exposure method, and device producing …

An immersion lithographic apparatus includes a liquid Supply system member configured to
contain a liquid in a space between a projection system of the lithographic apparatus and …

Provisional application No. 60/462,112, filed on Apr. 10, 2003, provisional application No.
60/484.476, A lithographic projection apparatus includes a liquid confine filed on Jul. 1 …

(57) ABSTRACT A stage system includes an object table constructed to hold an object, a
short stroke actuator element constructed to displace the object table over a first range of …

An exposure apparatus is provided Which can supply and collect a liquid in a prescribed
state, and that can suppress degradation of a pattern image projected onto a substrate. The …

(57) ABSTRACT Related US Application Data A measurement system configured to
measure a position dependent signal of an object table, the measurement system (60) …

An exposure apparatus is provided which can Supply and collect a liquid in a prescribed
State, and that can Suppress degradation of a pattern image projected onto a substrate. The …

An immersion lithography system that compensating for any displacement of the optical
caused by the immersion fluid. The system includes an optical assembly (14) to project an …