Atomic layer deposition of ZnO: a review
T Tynell, M Karppinen - Semiconductor Science and Technology, 2014 - iopscience.iop.org
Due to the unique set of properties possessed by ZnO, thin films of ZnO have received more
and more interest in the last 20 years as a potential material for applications such as thin-film …
and more interest in the last 20 years as a potential material for applications such as thin-film …
Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development
This article is a review of recent research and development advances in oxide thin film
transistors (TFTs) fabricated by atomic layer deposition (ALD) processes. The ALD process …
transistors (TFTs) fabricated by atomic layer deposition (ALD) processes. The ALD process …
A review of atomic layer deposition modelling and simulation methodologies: Density functional theory and molecular dynamics
The use of computational modelling and simulation methodologies has grown in recent
years as researchers try to understand the atomic layer deposition (ALD) process and create …
years as researchers try to understand the atomic layer deposition (ALD) process and create …
Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors
In this paper, we present the progress in the growth of nanoscale semiconductors grown via
atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD …
atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD …
Influence of thermal treatment and Fe do** on ZnO films by ultrasonic spray pyrolysis
Abstract Zinc Oxide and Fe-doped ZnO films (1, 2, 3%) were deposited onto glass substrates
by ultrasonic spray pyrolysis. Then, the films were thermally treated at 500° C for 2 h …
by ultrasonic spray pyrolysis. Then, the films were thermally treated at 500° C for 2 h …
Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory …
AR Choi, DH Lim, SY Shin, HJ Kang, D Kim… - Chemistry of …, 2024 - ACS Publications
Dynamic random-access memory (DRAM) devices are essential volatile memory
components in most digital devices. With the increasing demand for further low-power and …
components in most digital devices. With the increasing demand for further low-power and …
[HTML][HTML] Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
The ability to grow inorganic thin films with highly controllable structural and optical
properties at low substrate temperature enables the manufacturing of functional devices on …
properties at low substrate temperature enables the manufacturing of functional devices on …
From precursor chemistry to gas sensors: Plasma‐enhanced atomic layer deposition process engineering for zinc oxide layers from a nonpyrophoric zinc precursor for …
Abstract The identification of bis‐3‐(N, N‐dimethylamino) propyl zinc ([Zn (DMP) 2], BDMPZ)
as a safe and potential alternative to the highly pyrophoric diethyl zinc (DEZ) as atomic layer …
as a safe and potential alternative to the highly pyrophoric diethyl zinc (DEZ) as atomic layer …
Growth mechanism of atomic layer deposition of zinc oxide: A density functional theory approach
Atomic layer deposition of zinc oxide (ZnO) using diethylzinc (DEZ) and water is studied
using density functional theory. The reaction pathways between the precursors and ZnO …
using density functional theory. The reaction pathways between the precursors and ZnO …
Embedded metal oxide plasmonics using local plasma oxidation of AZO for planar metasurfaces
New methods for achieving high‐quality conducting oxide metasurfaces are of great
importance for a range of emerging applications from infrared thermal control coatings to …
importance for a range of emerging applications from infrared thermal control coatings to …