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Linearized EUV mask optimization based on the adjoint method
Mask optimization, a compensation method for the thick mask effect and the optical proximity
effect in projection lithography, is essential for advanced EUV-enabled production nodes …
effect in projection lithography, is essential for advanced EUV-enabled production nodes …
Deep learning-driven digital inverse lithography technology for DMD-based maskless projection lithography
JT Chen, YY Zhao, X Guo, XM Duan - Optics & Laser Technology, 2025 - Elsevier
Digital micromirror device (DMD)-based maskless projection lithography has gained
significant attention for its maskless, flexible, and cost-effective characteristics. However …
significant attention for its maskless, flexible, and cost-effective characteristics. However …
Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography
JT Chen, YY Zhao, JX Zhu, XM Duan - Optics Express, 2024 - opg.optica.org
Digital mask projection lithography (DMPL) technology is gaining significant attention due to
its characteristics of free-mask, flexibility, and low cost. However, when dealing with target …
its characteristics of free-mask, flexibility, and low cost. However, when dealing with target …
Model-driven optical proximity correction via hypergraph convolutional neural networks and its experimental demonstration
S Zhang, X Ma, C Huang, F Wang, GR Arce - Optics & Laser Technology, 2025 - Elsevier
Optical proximity correction (OPC) is a pivotal approach to correct the optical proximity effect
in the lithography process by optimizing the mask pattern. However, traditional pixel-based …
in the lithography process by optimizing the mask pattern. However, traditional pixel-based …
Optical proximity correction of hot-spot patterns with subwavelength size in DMD maskless projection lithography
X Guo, JT Chen, YY Zhao, SC Cai, XM Duan - Optics Letters, 2024 - opg.optica.org
When the critical dimension (CD) of resist patterns nears the resolution limit of the digital
micromirror device (DMD) maskless projection lithography (DMD-MPL), significant distortion …
micromirror device (DMD) maskless projection lithography (DMD-MPL), significant distortion …
Fast inverse lithography based on a model-driven block stacking convolutional neural network
R Chen, Y Zhao, H Li, R Chen - ar** efficient mask …
Advanced computational lithography based on information theory
B Wang, X Ma - Eighth International Workshop on Advanced …, 2024 - spiedigitallibrary.org
As the integration circuit manufacturing enters the advanced technology nodes,
computational lithography encounters a big challenge in breaking through the limitation of …
computational lithography encounters a big challenge in breaking through the limitation of …
Inverse lithography based on a physics-driven deep learning approach
R Chen, Y Zhao, R Chen - Eighth International Workshop on …, 2024 - spiedigitallibrary.org
Optical proximity correction (OPC) is essential for advanced semiconductor manufacturing
beyond 45nm node by improving lithography resolution. However, traditional OPC …
beyond 45nm node by improving lithography resolution. However, traditional OPC …