Atomically precise manufacturing (APM) is a key technique that involves the direct control of
atoms in order to manufacture products or components of products. It has been developed …

Infrared spectroscopy has become a useful tool to investigate surfaces. The theoretical and
experimental foundation of surface IR spectroscopy is described and selected examples are …

An updated fourth edition of the text that provides an understanding of chemical
transformations and the formation of structures at surfaces The revised and enhanced fourth …

Aqueous HF etching of silicon surfaces results in the removal of the surface oxide and
leaves behind silicon surfaces terminated by atomic hydrogen. The effect of varying the …

Ab initio molecular-orbital theory is used to unravel the mechanism of HF etching leading to
hydrogen-passivated silicon surfaces as observed experimentally. Total-energy calculations …

Hydrogen desorption kinetics from monohydride and dihydride species on crystalline-silicon
surfaces were measured using transmission Fourier-transform infrared (FTIR) spectroscopy …

Physical Chemistry of the Academy of Sciences of the GDR where he established theoretical
research on intermolecular interactions in adsorption and catalytic processes. His favorite …

The surface chemistry of silicon is just beginning to be explored, with the use of modern
tools of the surface scientist. Indeed, the unraveling of the surface chemistry of silicon has …

The chemical cleaning of semiconductor surfaces is crucial to the manufacture of integrated
circuits in the microelectronics industry. In particular, sequential peroxide solution chemical …

Clean silicon surfaces having low carbon and oxygen contamination are necessary for good
epitaxial overgrowth. Methods for low‐temperature preparation of clean surfaces are …