Experimental realization of an extended Fermi-Hubbard model using a 2D lattice of dopant-based quantum dots

X Wang, E Khatami, F Fei, J Wyrick… - Nature …, 2022 - nature.com
The Hubbard model is an essential tool for understanding many-body physics in condensed
matter systems. Artificial lattices of dopants in silicon are a promising method for the analog …

Atom‐by‐atom fabrication of single and few dopant quantum devices

J Wyrick, X Wang, RV Kashid… - Advanced Functional …, 2019 - Wiley Online Library
Atomically precise fabrication has an important role to play in develo** atom‐based
electronic devices for use in quantum information processing, quantum materials research …

Atomic-scale patterning of arsenic in silicon by scanning tunneling microscopy

TJZ Stock, O Warschkow, PC Constantinou, J Li… - ACS …, 2020 - ACS Publications
Over the past two decades, prototype devices for future classical and quantum computing
technologies have been fabricated by using scanning tunneling microscopy and hydrogen …

B-Doped δ-Layers and Nanowires from Area-Selective Deposition of BCl3 on Si(100)

KJ Dwyer, S Baek, A Farzaneh, M Dreyer… - … Applied Materials & …, 2021 - ACS Publications
Atomically precise, δ-doped structures forming electronic devices in Si have been routinely
fabricated in recent years by using depassivation lithography in a scanning tunneling …

Atomic-scale control of tunneling in donor-based devices

X Wang, J Wyrick, RV Kashid, P Namboodiri… - Communications …, 2020 - nature.com
Atomically precise donor-based quantum devices are a promising candidate for solid-state
quantum computing and analog quantum simulations. However, critical challenges in …

Metal sheet of atomic thickness embedded in silicon

LV Bondarenko, AY Tupchaya, YE Vekovshinin… - ACS …, 2021 - ACS Publications
The controlled confinement of the metallic delta-layer to a single atomic plane has so far
remained an unsolved problem. In the present study, the delta-type structure with atomic …

Electric current paths in a Si: P delta-doped device imaged by nitrogen-vacancy diamond magnetic microscopy

L Basso, P Kehayias, J Henshaw, MS Ziabari… - …, 2022 - iopscience.iop.org
The recently-developed ability to control phosphorous-do** of silicon at an atomic level
using scanning tunneling microscopy, a technique known as atomic precision advanced …

Si epitaxy on Cl-Si (100)

A Farzaneh, RE Butera - Applied Surface Science, 2022 - Elsevier
Current atomically-precise fabrication methods in Si utilize a scanning tunneling microscope
(STM) to pattern a monatomic resist adsorbed on Si (100). Recent interest in the use of Cl …

Influence of imperfections on tunneling rate in -layer junctions

JP Mendez, S Misra, D Mamaluy - Physical Review Applied, 2023 - APS
The atomically precise placement of dopants in semiconductors using scanning tunneling
microscopes has been used to create planar dopant-based devices, enabling the …

Low-Resistance, High-Yield Electrical Contacts to Atom Scale Devices Using Palladium Silicide

SW Schmucker, PN Namboodiri, R Kashid, X Wang… - Physical review applied, 2019 - APS
Scanning tunneling microscopy (STM) enables the fabrication of two-dimensional δ-doped
structures in Si with atomistic precision, with applications from tunnel field-effect transistors …