All WSe2 1T1R resistive RAM cell for future monolithic 3D embedded memory integration

M Sivan, Y Li, H Veluri, Y Zhao, B Tang, X Wang… - Nature …, 2019 - nature.com
Abstract 3D monolithic integration of logic and memory has been the most sought after
solution to surpass the Von Neumann bottleneck, for which a low-temperature processed …

Recent developments in black phosphorous transistors: a review

A Pon, A Bhattacharyya, R Rathinam - Journal of Electronic Materials, 2021 - Springer
Abstract Two-dimensional (2D) materials like graphene, phosphorene, germanene, silicene,
and transition metal dichalcogenides have attracted intense research attention because of …

BSIM6: Analog and RF compact model for bulk MOSFET

YS Chauhan, S Venugopalan… - … on Electron Devices, 2013 - ieeexplore.ieee.org
BSIM6 is the latest industry-standard bulk MOSFET model from the BSIM group developed
specially for accurate analog and RF circuit designs. The popular real-device effects have …

Towards interdependencies of aging mechanisms

H Amrouch, VM van Santen, T Ebi… - 2014 IEEE/ACM …, 2014 - ieeexplore.ieee.org
With technology in deep nano scale, the susceptibility of transistors to various aging
mechanisms such as Negative/Positive Bias Temperature Instability (NBTI/PBTI) and Hot …

Machine Learning Based Compact Model Design for Reconfigurable FETs

M Reuter, J Wilm, A Kramer… - IEEE Journal of the …, 2024 - ieeexplore.ieee.org
In integrated circuit design compact models are the abstraction layer which connects
semiconductor physics and circuit simulation. Established compact models like BSIM …

Generating Predictive Models for Emerging Semiconductor Devices

M Reuter, A Kramer, D Lee, J Trommer… - IEEE Journal of the …, 2023 - ieeexplore.ieee.org
Circuit design requires fast and scalable models which are compatible to modern electronic
design automation tools. For this task typically analytical compact models are preferred …

Interdependencies of degradation effects and their impact on computing

H Amrouch, VM van Santen, J Henkel - IEEE Design & Test, 2016 - ieeexplore.ieee.org
Editor's note: Process variations, aging and wearout, are nonidealities that lead to
suboptimal system performance and increased power. In order to understand the effects of …

Impact of radiation on negative capacitance finfet

G Bajpai, A Gupta, O Prakash, G Pahwa… - 2020 IEEE …, 2020 - ieeexplore.ieee.org
This is the first work to investigate the susceptibility of Negative Capacitance Field-Effect
Transistor (NC-FET) to radiation. Using TCAD models, which are well calibrated with 14nm …

Analysis of ESD behavior of stacked nMOSFET RF switches in bulk technology

M Rigato, C Fleury, B Schwarz… - … on Electron Devices, 2018 - ieeexplore.ieee.org
The operation of stacked MOSFET circuit for RF switch application under electrostatic
discharge (ESD) conditions is studied by transmission line pulse (TLP) and transient …

Process-voltage-temperature variations assessment in energy-aware resistive RAM-based FPGAs

T Rizzi, A Baroni, A Glukhov, D Bertozzi… - … on Device and …, 2023 - ieeexplore.ieee.org
Resistive Random Access Memory (RRAM) technology holds promises to improve the Field
Programmable Gate Array (FPGA) performance, reduce the area footprint, and dramatically …