Sputtering physical vapour deposition (PVD) coatings: A critical review on process improvement and market trend demands
Physical vapour deposition (PVD) is a well-known technology that is widely used for the
deposition of thin films regarding many demands, namely tribological behaviour …
deposition of thin films regarding many demands, namely tribological behaviour …
Physics and technology of magnetron sputtering discharges
JT Gudmundsson - Plasma Sources Science and Technology, 2020 - iopscience.iop.org
Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …
of both metallic and compound thin films and is utilized in numerous industrial applications …
Progress on current-carry friction and wear: an overview from measurements to mechanism
S Li, X Yang, Y Kang, Z Li, H Li - Coatings, 2022 - mdpi.com
As aerospace, electrified railway, weapon equipment manufacturing, and other fields have
leapt forward, the operating environment of current-carrying friction pairs is becoming …
leapt forward, the operating environment of current-carrying friction pairs is becoming …
[HTML][HTML] Bipolar HiPIMS for tailoring ion energies in thin film deposition
J Keraudy, RPB Viloan, MA Raadu, N Brenning… - Surface and Coatings …, 2019 - Elsevier
The effects of a positive pulse following a high-power impulse magnetron sputtering
(HiPIMS) pulse are studied using energy-resolved mass spectrometry. This includes …
(HiPIMS) pulse are studied using energy-resolved mass spectrometry. This includes …
Energy-enhanced deposition of copper thin films by bipolar high power impulse magnetron sputtering
Abstract Bipolar Pulse High Power Impulse Magnetron Sputtering (BP-HiPIMS) was
investigated and used in this work to control the ion bombardment process of growing thin …
investigated and used in this work to control the ion bombardment process of growing thin …
The influence of positive pulses on HiPIMS deposition of hard DLC coatings
Diamond-like Carbon (DLC) coatings were deposited by a novel HiPIMS method that
incorporates positive voltage pulses at the end of the conventional HiPIMS discharge …
incorporates positive voltage pulses at the end of the conventional HiPIMS discharge …
Pulse length selection in bipolar HiPIMS for high deposition rate of smooth, hard amorphous carbon films
Amorphous carbon films were deposited by bipolar HiPIMS, as a function of negative and
positive voltage pulse lengths (50-175 μs and 0-175 μs respectively), using argon as sputter …
positive voltage pulse lengths (50-175 μs and 0-175 μs respectively), using argon as sputter …
[HTML][HTML] Copper thin films deposited using different ion acceleration strategies in HiPIMS
The growth of Cu thin films by low-energy ion-bombardment using bipolar and conventional
HiPIMS pulse configurations to the target in combination with different biasing methods of …
HiPIMS pulse configurations to the target in combination with different biasing methods of …
Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering
M Rudolph, N Brenning, MA Raadu… - Plasma Sources …, 2020 - iopscience.iop.org
High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapour
deposition technique. While HiPIMS provides a high flux of metal ions to the substrate, the …
deposition technique. While HiPIMS provides a high flux of metal ions to the substrate, the …
Ion density evolution in a high-power sputtering discharge with bipolar pulsing
N Britun, M Michiels, T Godfroid, R Snyders - Applied Physics Letters, 2018 - pubs.aip.org
Time evolution of sputtered metal ions in high power impulse magnetron sputtering (HiPIMS)
discharge with a positive voltage pulse applied after a negative one (regime called “bipolar …
discharge with a positive voltage pulse applied after a negative one (regime called “bipolar …