[PDF][PDF] Fabrication of GaN Nano Pillars using Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) Technique: A Review
PK Savita, DK Chaudhary, HP Bhasker - … -communications.cmpcollege.ac.in
The ICP-RIE is very popular experimental technique frequently used in the field of
fabrication of semiconductor nanostructures as well as their devices [1-5]. Here, we present …
fabrication of semiconductor nanostructures as well as their devices [1-5]. Here, we present …
Optical properties of GaN nanopillars fabricated using ICPRIE technique
Gallium nitride (GaN) nanopillars are fabricated by Inductively Coupled Plasma Reactive Ion
etching (ICPRIE) technique without any prior lithographic processing. Nanopillars are found …
etching (ICPRIE) technique without any prior lithographic processing. Nanopillars are found …