In this era, electronic devices such as mobile phones, computers, laptops, sensors, and
many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying …

SU-8 has become the favourite photoresist for high-aspect-ratio (HAR) and three-
dimensional (3D) lithographic patterning due to its excellent coating, planarization and …

Recent innovations in the area of micro-and nanofabrication have created a unique
opportunity for patterning surfaces with features with lateral dimensions spanning over the …

To overcome the diffraction constraints of traditional optical lithography, the next generation
lithographies (NGLs) will utilize any one or more of EUV (extreme ultraviolet), X-ray, electron …

Nanomolding usually refers to a top-down fabrication method by which a formable or
moldable material is shaped using a mold of nanoscale dimensions. Nanomolding is the …

This review provides a survey of lithography techniques and the resist materials employed
with these techniques. The first part focuses on the conventional lithography methods used …

Proton beam (p-beam) writing is a new direct-writing process that uses a focused beam of
MeV protons to pattern resist material at nanodimensions. The process, although similar in …

Adaptive programmable materials have attracted increasing attention due to their high
functionality, autonomous behavior, encapsulation, and site-specific confinement …

SU-8 has been widely used in a variety of applications for creating structures in micro-scale
as well as sub-micron scales for more than 15 years. One of the most common structures …

The effect of dextran nanoparticles on the conformation and compaction of single DNA
molecules confined in a nanochannel was investigated with fluorescence microscopy. It was …