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Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect
Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
eduPIC: an introductory particle based code for radio-frequency plasma simulation
Particle based simulations are indispensable tools for numerical studies of charged particle
swarms and low-temperature plasma sources. The main advantage of such approaches is …
swarms and low-temperature plasma sources. The main advantage of such approaches is …
The effect of electron induced secondary electrons on the characteristics of low-pressure capacitively coupled radio frequency plasmas
We investigate the effects of secondary electrons (SEs), induced by electrons im**ing on
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas
In most PIC/MCC simulations of radio frequency capacitively coupled plasmas (CCPs)
several simplifications are commonly made:(i) fast neutrals are not traced,(ii) heavy particle …
several simplifications are commonly made:(i) fast neutrals are not traced,(ii) heavy particle …
PIC/MCC simulation of capacitively coupled discharges: Effect of particle management and integration
Abstract A PIC/MCC simulation model for the analysis of low-temperature discharge
plasmas is represented which takes the common leapfrog and the velocity Verlet algorithm …
plasmas is represented which takes the common leapfrog and the velocity Verlet algorithm …
Ion energy distribution function in very high frequency capacitive discharges excited by saw-tooth waveform
Tailoring the ion energy distribution function (IEDF) is vital for advanced plasma processing
applications. Capacitively coupled plasma (CCP) discharges excited using a non-sinusoidal …
applications. Capacitively coupled plasma (CCP) discharges excited using a non-sinusoidal …
2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms
The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
Numerical simulation of the breakdown process of micro-discharge sustained by field emission
Micro-discharge is the process that gas breakdown occurs on a small spatial scale to
generate plasma. With the decrease of the discharge scale, the high electric field makes the …
generate plasma. With the decrease of the discharge scale, the high electric field makes the …
Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms
Using particle-in-cell simulations, we predict that it is possible to obtain a significant
difference between the ion flux to the powered electrode and that to the grounded electrode …
difference between the ion flux to the powered electrode and that to the grounded electrode …
A computationally assisted technique to measure material-specific surface coefficients in capacitively coupled plasmas based on characteristics of the ion flux-energy …
We present a new method for the determination of surface coefficients, more specifically the
effective ion-induced secondary electron yield, γ eff, and the effective elastic electron …
effective ion-induced secondary electron yield, γ eff, and the effective elastic electron …