Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect

T Lafleur - Plasma Sources Science and Technology, 2015‏ - iopscience.iop.org
Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …

eduPIC: an introductory particle based code for radio-frequency plasma simulation

Z Donkó, A Derzsi, M Vass, B Horváth… - Plasma Sources …, 2021‏ - iopscience.iop.org
Particle based simulations are indispensable tools for numerical studies of charged particle
swarms and low-temperature plasma sources. The main advantage of such approaches is …

The effect of electron induced secondary electrons on the characteristics of low-pressure capacitively coupled radio frequency plasmas

B Horváth, J Schulze, Z Donkó… - Journal of Physics D …, 2018‏ - iopscience.iop.org
We investigate the effects of secondary electrons (SEs), induced by electrons im**ing on
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …

Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas

A Derzsi, I Korolov, E Schüngel, Z Donkó… - … Sources Science and …, 2015‏ - iopscience.iop.org
In most PIC/MCC simulations of radio frequency capacitively coupled plasmas (CCPs)
several simplifications are commonly made:(i) fast neutrals are not traced,(ii) heavy particle …

PIC/MCC simulation of capacitively coupled discharges: Effect of particle management and integration

A Sun, MM Becker, D Loffhagen - Computer Physics Communications, 2016‏ - Elsevier
Abstract A PIC/MCC simulation model for the analysis of low-temperature discharge
plasmas is represented which takes the common leapfrog and the velocity Verlet algorithm …

Ion energy distribution function in very high frequency capacitive discharges excited by saw-tooth waveform

S Sharma, N Sirse, A Kuley, MM Turner - Physics of Plasmas, 2021‏ - pubs.aip.org
Tailoring the ion energy distribution function (IEDF) is vital for advanced plasma processing
applications. Capacitively coupled plasma (CCP) discharges excited using a non-sinusoidal …

2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms

L Wang, P Hartmann, Z Donko, YH Song… - … Sources Science and …, 2021‏ - iopscience.iop.org
The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …

Numerical simulation of the breakdown process of micro-discharge sustained by field emission

C Guo, H Wu, Y Peng, Z Wang, W Jiang… - Journal of Physics D …, 2022‏ - iopscience.iop.org
Micro-discharge is the process that gas breakdown occurs on a small spatial scale to
generate plasma. With the decrease of the discharge scale, the high electric field makes the …

Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms

B Bruneau, T Novikova, T Lafleur… - Plasma Sources …, 2014‏ - iopscience.iop.org
Using particle-in-cell simulations, we predict that it is possible to obtain a significant
difference between the ion flux to the powered electrode and that to the grounded electrode …

A computationally assisted technique to measure material-specific surface coefficients in capacitively coupled plasmas based on characteristics of the ion flux-energy …

C Schulze, Z Donkó, J Benedikt - Plasma Sources Science and …, 2022‏ - iopscience.iop.org
We present a new method for the determination of surface coefficients, more specifically the
effective ion-induced secondary electron yield, γ eff, and the effective elastic electron …