Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Catalyst synthesis with precise control over the structure of catalytic active sites at the atomic
level is of essential importance for the scientific understanding of reaction mechanisms and …

Atomic layer deposition (ALD) is an attractive method to deposit thin films for advanced
technological applications such as microelectronics and nanotechnology. One material …

Radioactive waste vitrification has been carried out industrially in several countries for
nearly 40 years. Research into the formulation and long term behavior of high and …

Multi-metallic nanoparticles constitute a new class of materials offering the opportunity to
tune the properties via the composition, atomic ordering and size. In particular, supported …

Highly active ruthenium oxide was uniformly coated on vertically aligned carbon nanotube
forests for pseudocapacitor electrodes in enhanced energy storage applications. Atomic …

Atomic layer deposition technique is able to grow conformal thin films over high aspect ratio
structures. This article reviews the various aspects of oxides grown by this method including …

Deposition of thin films with desired compositions, conformality and bonding to substrates is
a key component in nanotechnology research. The growth of metal films by atomic layer …

Atomic layer deposition (ALD) processes are reported for ruthenium (Ru) and ruthenium
oxide (RuO2) using a zero-oxidation state liquid precursor, η4-2, 3-dimethylbutadiene …

Atomic layer deposition (ALD) of ruthenium dioxide (RuO2) thin films using metalorganic
precursors and O2 can be challenging because the O2 dose needs to be precisely tuned …