Nanoscale volume diffusion: Diffusion in thin films, multilayers and nanoobjects (hollow nanoparticles)

Z Erdélyi, DL Beke - Journal of materials science, 2011 - Springer
Diffusion on the nano/atomic scales in multilayers, thin films has many challenging features
even if the role of structural defects (grain-boundaries, dislocations, etc.) can be neglected …

Hard X-ray micro-spectroscopy at Berliner Elektronenspeicherring für Synchrotronstrahlung II

A Erko, I Zizak - Spectrochimica Acta Part B: Atomic Spectroscopy, 2009 - Elsevier
Hard X-ray micro-spectroscopy at Berliner Elektronenspeicherring für Synchrotronstrahlung II
- ScienceDirect Skip to main contentSkip to article Elsevier logo Journals & Books Search …

Metamorphic mineral reactions: Porphyroblast, corona and symplectite growth

F Gaidies, R Milke, W Heinrich, R Abart - 2017 - pubs.geoscienceworld.org
Much of the Earth's dynamics is related to mineral reactions in the solid-state. Classically,
this is referred to as metamorphic crystallization (Kretz, 1994). Based on the chemical …

On the influence of the stacking sequence in the nucleation of Cu3Si: Experiment and the testing of nucleation models

M Ibrahim, Z Balogh, P Stender, R Schlesiger… - Acta materialia, 2014 - Elsevier
The nucleation of the Cu 3 Si phase was studied on sputter-deposited Cu/Si/Cu trilayered
specimens both in curved and planar geometry. Two experimental methods, atom probe …

Phase growth in an amorphous Si–Cu system, as shown by a combination of SNMS, XPS, XRD and APT techniques

B Parditka, M Verezhak, Z Balogh, A Csik, GA Langer… - Acta Materialia, 2013 - Elsevier
It is shown, by the combination of secondary neutral mass spectrometry (SNMS), X-ray
diffraction and atom probe tomography (APT), that the growth of a Cu 3 Si crystalline layer …

The transition from linear to-parabolic growth of Cu3Si phase in Cu/a-Si system

B Parditka, H Zaka, G Erdélyi, GA Langer, M Ibrahim… - Scripta Materialia, 2018 - Elsevier
The solid state reaction between Cu and a-Si films was investigated at 150–200° C by depth
profiling with secondary neutral mass spectrometry. Intermixing was observed leading to the …

Physical origin of thickness-controlled sequential phase formation during reactive diffusion: Atomistic modeling

A Portavoce, G Tréglia - Physical Review B—Condensed Matter and Materials …, 2010 - APS
Experimental studies of reactive diffusion during annealing of a film deposited on a substrate
reveal that the phase formation proceeds either simultaneously or sequentially depending …

Reactive diffusion in the presence of a diffusion barrier: Experiment and model

D Mangelinck, T Luo, C Girardeaux - Journal of Applied Physics, 2018 - pubs.aip.org
Reactions in thin films and diffusion barriers are important for applications such as protective
coatings, electrical contact, and interconnections. In this work, the effect of a barrier on the …

Nanoresolution interface studies in thin films by synchrotron x‐ray diffraction and by using x‐ray waveguide structure

Z Erdélyi, C Cserháti, A Csik, L Daróczi… - X‐Ray Spectrometry …, 2009 - Wiley Online Library
In the last years we performed several measurements with synchrotron radiation of several
facilities to reveal interesting interface phenomena on the nanoscale. We used both x‐ray …

Linear-parabolic transition in reactive diffusion–A concept of kinetic modelling

JJ Tomán, G Schmitz, Z Erdélyi - Computational Materials Science, 2017 - Elsevier
In Erdélyi and Schmitz (2012) a flexible concept for the computational description of the
phase formation and growth in solid state reactions was described. Unlike in other …