The 2012 plasma roadmap

S Samukawa, M Hori, S Rauf… - Journal of Physics D …, 2012‏ - iopscience.iop.org
Low-temperature plasma physics and technology are diverse and interdisciplinary fields.
The plasma parameters can span many orders of magnitude and applications are found in …

Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect

T Lafleur - Plasma Sources Science and Technology, 2015‏ - iopscience.iop.org
Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …

[ספר][B] Physics of radio-frequency plasmas

P Chabert, N Braithwaite - 2011‏ - books.google.com
Low-temperature radio frequency plasmas are essential in various sectors of advanced
technology, from micro-engineering to spacecraft propulsion systems and efficient sources …

Method of controlling the film properties of PECVD-deposited thin films

SY Choi, JM White, Q Wang, BS Park - US Patent 7,785,672, 2010‏ - Google Patents
Related US Application Data(74) Attorney, Agent, or Firm Shirley L. Church (63)
Continuation-in-part of application No. 10/962.936, filed on Oct. 12, 2004, which is a …

Plasma uniformity control by gas diffuser curvature

SY Choi, BS Park, JM White, RL Tiner - US Patent 8,074,599, 2011‏ - Google Patents
Embodiments of a gas distribution plate for distributing gas in a processing chamber are
provided. In one embodiment, a gas distribution assembly for a plasma processing chamber …

[HTML][HTML] Electron dynamics in low pressure capacitively coupled radio frequency discharges

S Wilczek, J Schulze, RP Brinkmann, Z Donkó… - Journal of Applied …, 2020‏ - pubs.aip.org
In low temperature plasmas, the interaction of the electrons with the electric field is an
important current research topic that is relevant for many applications. Particularly, in the low …

Plasma processing of low-k dielectrics

MR Baklanov, JF de Marneffe, D Shamiryan… - Journal of Applied …, 2013‏ - pubs.aip.org
This paper presents an in-depth overview of the present status and novel developments in
the field of plasma processing of low dielectric constant (low-k) materials developed for …

Enhancement of Ohmic and Stochastic Heating by Resonance Effects<? format?> in Capacitive Radio Frequency Discharges: A Theoretical Approach

T Mussenbrock, RP Brinkmann, MA Lieberman… - Physical review …, 2008‏ - APS
In low-pressure capacitive radio frequency discharges, two mechanisms of electron heating
are domi<? format?> nant:(i) Ohmic heating due to collisions of electrons with neutrals of the …

RF bus and RF return bus for plasma chamber electrode

CA Sorensen, J Kudela, RL Tiner, S Anwar… - US Patent …, 2015‏ - Google Patents
For coupling RF power from an RF input of a plasma chamber to the interior of a plasma
chamber, an RF bus conductor is connected between the RF input and a plasma chamber …

Collisionless heating in capacitive discharges enhanced by dual-frequency excitation

MM Turner, P Chabert - Physical review letters, 2006‏ - APS
We discuss collisionless electron heating in capacitive discharges excited by a combination
of two disparate frequencies. By develo** an analytical model, we find, contrary to …