Cylindrical surrounding-gate MOSFETs with electrically induced source/drain extension
C Li, Y Zhuang, R Han - Microelectronics Journal, 2011 - Elsevier
A novel cylindrical surrounding gate MOSFETs with electrically induced source/drain
extension is proposed and demonstrated by numerical simulation for the first time. In the …
extension is proposed and demonstrated by numerical simulation for the first time. In the …
Double gate graphene nanoribbon field effect transistor with electrically induced junctions for source and drain regions
A Naderi - Journal of Computational Electronics, 2016 - Springer
In this paper a novel graphene nanoribbon transistor with electrically induced junction for
source and drain regions is proposed. An auxiliary junction is used to form electrically …
source and drain regions is proposed. An auxiliary junction is used to form electrically …
Quantum simulation study of a new carbon nanotube field-effect transistor with electrically induced source/drain extension
In this paper, we present the unique features exhibited by a proposed structure of coaxially
gated carbon nanotube field-effect transistor (CNTFET) with doped source and drain …
gated carbon nanotube field-effect transistor (CNTFET) with doped source and drain …
Analytical threshold voltage model for cylindrical surrounding-gate MOSFET with electrically induced source/drain extensions
C Li, Y Zhuang, R Han, G **, J Bao - Microelectronics Reliability, 2011 - Elsevier
Physics-based analytical threshold voltage model for cylindrical surrounding-gate MOSFET
with electrically induced source/drain extensions is presented. The effect of inversion …
with electrically induced source/drain extensions is presented. The effect of inversion …
Millisecond microwave annealing: Driving microelectronics nano
The efficient deposition of high frequency microwave energy into the top several microns of
a semiconducting material was experimentally demonstrated as a highly effective …
a semiconducting material was experimentally demonstrated as a highly effective …
p-HEMT with tailored field
S Mil'shtein, P Ersland, S Somisetty, C Gil - Microelectronics journal, 2003 - Elsevier
The high electron mobility in heterostructure devices stems from fact that electrons are
injected into intrinsic layer of a semiconductor material and are confined into two …
injected into intrinsic layer of a semiconductor material and are confined into two …
3D modeling of dual-gate FinFET
S Mil'shtein, L Devarakonda, B Zanchi… - Nanoscale Research …, 2012 - Springer
The tendency to have better control of the flow of electrons in a channel of field-effect
transistors (FETs) did lead to the design of two gates in junction field-effect transistors, field …
transistors (FETs) did lead to the design of two gates in junction field-effect transistors, field …
A study of the electrical characteristics of N {sub 2} O gate oxide 30 A
GY Eom - Journal of the Korean Physical Society, 2004 - osti.gov
In the era of sub-micron devices, superior ultra-thin gate-oxide characteristics are required.
This paper presents a novel process to improve the electrical characteristics and the …
This paper presents a novel process to improve the electrical characteristics and the …
[PDF][PDF] Solid-State and Integrated Circuits Technology
R Huang, M Yu, JJ Liou, T Hiramoto, ЈC Claeys - International Conference on - cityu.edu.hk
Many new applications of plasma immersion ion implantation (PIII) have recently emerged.
In addition to the surface modification and fabrication of conventional metallurgical and …
In addition to the surface modification and fabrication of conventional metallurgical and …
Improvement of electrical properties in Sub-0.1 μm MOSFETS with a novel shallow trench isolation structure
GY Eom, HS Oh - Journal of the Korean Physical Society, 2003 - safetylit.org
This paper presents a novel process to improve the electrical characteristics and the
reliability in submicron (< 0.1 μm) Metal Oxide Semiconductor Fleld Effect Transistors …
reliability in submicron (< 0.1 μm) Metal Oxide Semiconductor Fleld Effect Transistors …