Cylindrical surrounding-gate MOSFETs with electrically induced source/drain extension

C Li, Y Zhuang, R Han - Microelectronics Journal, 2011 - Elsevier
A novel cylindrical surrounding gate MOSFETs with electrically induced source/drain
extension is proposed and demonstrated by numerical simulation for the first time. In the …

Double gate graphene nanoribbon field effect transistor with electrically induced junctions for source and drain regions

A Naderi - Journal of Computational Electronics, 2016 - Springer
In this paper a novel graphene nanoribbon transistor with electrically induced junction for
source and drain regions is proposed. An auxiliary junction is used to form electrically …

Quantum simulation study of a new carbon nanotube field-effect transistor with electrically induced source/drain extension

Z Arefinia, AA Orouji - IEEE Transactions on Device and …, 2009 - ieeexplore.ieee.org
In this paper, we present the unique features exhibited by a proposed structure of coaxially
gated carbon nanotube field-effect transistor (CNTFET) with doped source and drain …

Analytical threshold voltage model for cylindrical surrounding-gate MOSFET with electrically induced source/drain extensions

C Li, Y Zhuang, R Han, G **, J Bao - Microelectronics Reliability, 2011 - Elsevier
Physics-based analytical threshold voltage model for cylindrical surrounding-gate MOSFET
with electrically induced source/drain extensions is presented. The effect of inversion …

Millisecond microwave annealing: Driving microelectronics nano

K Thompson, JH Booske, RL Ives, J Lohr… - Journal of Vacuum …, 2005 - pubs.aip.org
The efficient deposition of high frequency microwave energy into the top several microns of
a semiconducting material was experimentally demonstrated as a highly effective …

p-HEMT with tailored field

S Mil'shtein, P Ersland, S Somisetty, C Gil - Microelectronics journal, 2003 - Elsevier
The high electron mobility in heterostructure devices stems from fact that electrons are
injected into intrinsic layer of a semiconductor material and are confined into two …

3D modeling of dual-gate FinFET

S Mil'shtein, L Devarakonda, B Zanchi… - Nanoscale Research …, 2012 - Springer
The tendency to have better control of the flow of electrons in a channel of field-effect
transistors (FETs) did lead to the design of two gates in junction field-effect transistors, field …

A study of the electrical characteristics of N {sub 2} O gate oxide 30 A

GY Eom - Journal of the Korean Physical Society, 2004 - osti.gov
In the era of sub-micron devices, superior ultra-thin gate-oxide characteristics are required.
This paper presents a novel process to improve the electrical characteristics and the …

[PDF][PDF] Solid-State and Integrated Circuits Technology

R Huang, M Yu, JJ Liou, T Hiramoto, ЈC Claeys - International Conference on - cityu.edu.hk
Many new applications of plasma immersion ion implantation (PIII) have recently emerged.
In addition to the surface modification and fabrication of conventional metallurgical and …

Improvement of electrical properties in Sub-0.1 μm MOSFETS with a novel shallow trench isolation structure

GY Eom, HS Oh - Journal of the Korean Physical Society, 2003 - safetylit.org
This paper presents a novel process to improve the electrical characteristics and the
reliability in submicron (< 0.1 μm) Metal Oxide Semiconductor Fleld Effect Transistors …