Scanning probe microscopy (SPM) has become an essential surface characterization
technique in research and development. By concept, SPM performance crucially depends …

Beams of electrons and ions are now fairly routinely focused to dimensions in the nanometer
range. Since the beams can be used to locally alter material at the point where they are …

The nanoscaling of metamaterial structures represents a technological challenge toward
their application in the optical frequency range. In this work we demonstrate tailored chiro …

A computer simulation was developed to simulate electron-beam-induced deposition
(EBID). Simulated growth produced high-aspect-ratio, nanoscale pillar structures by …

To increase the efficiency of current electronics, a specific challenge for the next generation
of memory, sensing and logic devices is to find suitable strategies to move from two-to three …

We discuss the tailoring of linear chiroptical effects in three-dimensional plasmonic
nanohelices by means of challenging technological nanoscaling approaches, allowing the …

Electron-induced fragmentation of the HFeCo3 (CO) 12 precursor allows direct-write
fabrication of 3D nanostructures with metallic contents of up to> 95 at%. While microstructure …

The electron‐beam‐induced deposition of silicon oxide from tetraethyorthosilicate and
tungsten from tungsten hexafluoride is simulated via a Monte Carlo simulation. Pseudo one …

This work demonstrates electron beam induced deposition of silicon from a SiCl 4 liquid
precursor in a transmission electron microscope and a scanning electron microscope …

Electron beam induced deposition is among the most prospective methods for size-and
position-controllable nanofabrication of three-dimensional structures. Direct-write maskless …