Amorphous/crystalline silicon heterojunction (SHJ) solar cells are well known for their
inherent high open-circuit voltage (V OC) potential, much better temperature coefficient …

Abstract Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012
consisting of the individual perspectives of 16 leading experts in the various sub-fields of low …

Publisher Summary Functional coating systems can be fabricated by different deposition
techniques. Among the above processes, plasma-enhanced chemical vapour deposition …

This is a single-source treatment of developments in TFT production from international
specialists. It interweaves overlap** areas in multiple disciplines pertinent to transistor …

Chemical vapor deposition (CVD) is a technique for the fabrication of thin films of polymeric
materials, which has successfully overcome some of the issues faced by wet chemical …

The dynamics of cyanobacterial silicification was investigated using synchrotron-based
Fourier transform infrared micro-spectroscopy. The changes in exo-polymeric …

We have experimentally determined the crystallization rate of plasma-produced amorphous
silicon powder undergoing in-flight thermal annealing, and have found a significant …

The structure of a-Si: H, deposited at rates in excess of 100 Å/s by the hot wire chemical
vapor deposition technique, has been examined by x-ray diffraction XRD, Raman …

Amorphous hydrogenated silicon films were grown using an atmospheric pressure helium
and hydrogen plasma with silane added downstream of the source. A maximum deposition …

Low-temperature plasmas are an important tool of modern technology for deposition and
erosion of thin films. In a plasma, an initial monomer is dissociated and ionized. A flux of …