Ferroelectric field effect transistors (FeFETs): advancements, challenges and exciting prospects for next generation non-volatile memory (NVM) applications

J Ajayan, P Mohankumar, D Nirmal… - Materials Today …, 2023 - Elsevier
Data intensive applications such as AI (Artificial Intelligence) and IoT (Internet of Things)
demand high performance and highly reliable non-volatile memories (NVM). FeFET offers …

Low-frequency noise characteristics of recessed channel ferroelectric field-effect transistors

B Kwak, J Kim, K Lee, W Shin… - IEEE Electron Device …, 2024 - ieeexplore.ieee.org
This study investigates low-frequency noise (LFN) and random telegraph noise (RTN)
characteristics of hafnium-zirconium oxide (HZO) ferroelectric field-effect transistors with …

Tunable Ferroelectric Properties of HfO-Based Oxides: Role of Aluminum Do** and Bottom Electrodes

C Han, KR Kwon, S Jeong, B Kwak… - … on Electron Devices, 2024 - ieeexplore.ieee.org
We investigate the impact of Al concentrations and different bottom electrodes on the
crystallinity, ferroelectricity, energy storage density (ESD), and oxygen defects in Hf Zr O …

Effects of Deposition Power and Thermal Treatment on Ferroelectric Properties of Sputtered HfZrO

C Han, KR Kwon, J Yim, J Kim, S Kim… - … on Electron Devices, 2024 - ieeexplore.ieee.org
In this letter, we investigated the ferroelectric characteristics of Hf0. 5Zr0. 5O2 (HZO)
deposited by radio frequency (RF) sputtering at various deposition powers and the impact of …

Suppression of Gate-Induced-Drain-Leakage Utilizing Local Polarization in Ferroelectric-Gate Field-Effect Transistors for DRAM Applications

B Kwak, K Lee, S Kim, D Kwon - IEEE Electron Device Letters, 2024 - ieeexplore.ieee.org
This study proposed a novel approach to enhance the retention characteristics in dynamic
random access memory (DRAM) by employing a unique local polarization method …

Signal-Processing Application Based on Ferroelectric Tunnel Field-Effect Transistor

B Kwak, D Kwon, H Kim - IEEE Transactions on …, 2024 - ieeexplore.ieee.org
This study introduces a ferroelectric tunnel field-effect transistor (Fe-TFET) capable of
implementing three types of signal processing for frequency doubler, phase shifter, and …

Impact of Work-Function Variation in Ferroelectric Field-Effect Transistor

SY Jung, H Kim, J Lee, JH Kim - IEEE Journal of the Electron …, 2024 - ieeexplore.ieee.org
We analyzed the impact of work-function variation (WFV) in ferroelectric field-effect transistor
(FeFET). To analyze the operation characteristics, we employed the technology computer …

Simulation of a Recessed Channel Ferroelectric-Gate Field-Effect Transistor with a Dual Ferroelectric Gate Stack for Memory Application

S Chen, DH Ahn, SU An, Y Kim - 2023 7th IEEE Electron …, 2023 - ieeexplore.ieee.org
Over the years, there has been much research on ferroelectric field-effect transistors
(FeFETs) for memory applications. In this work, we propose a novel recessed channel …

TCAD simulation study of dual ferroelectric gate field-effect transistors with a recessed channel geometry for non-volatile memory applications

S Chen, DH Ahn, SU An, TH Noh, Y Kim - Journal of the Korean Physical …, 2024 - Springer
In this study, we propose a ferroelectric FET (FeFET) structure termed dual ferroelectric
recessed channel FeFET (DF-RFeFET), employing metal–ferroelectric (FE)–metal–FE …

High-K dual metal gate-nano tube (DMG-NT) field effect transistors (FETs): A possible solution to diminish the effect of temperature variation

V Purwar - International Journal of Nano Dimension, 2024 - oiccpress.com
This paper provides a possible solution to minimize the effect of temperature on nano-tube
(NT) FETs by applying performance enhancers. Here high-k and dual metal gates (DMG) …