Reliability of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges
Ferroelectric transistors (FeFETs) based on doped hafnium oxide (HfO2) have received
much attention due to their technological potential in terms of scalability, high-speed, and …
much attention due to their technological potential in terms of scalability, high-speed, and …
Structure-evolution-designed amorphous oxides for dielectric energy storage
Y Yu, Q Zhang, Z Xu, W Zheng, J Xu, Z **, L Zhu… - Nature …, 2023 - nature.com
Recently, rapidly increased demands of integration and miniaturization continuously
challenge energy densities of dielectric capacitors. New materials with high recoverable …
challenge energy densities of dielectric capacitors. New materials with high recoverable …
[HTML][HTML] Special topic on ferroelectricity in hafnium oxide: Materials and devices
Ferroelectricity is a material property that enables a large variety of device applications like
nonvolatile memories, variable capacitors, sensors, actuators, and energy …
nonvolatile memories, variable capacitors, sensors, actuators, and energy …
Stabilization of thick, rhombohedral Hf0. 5Zr0. 5O2 epilayer on c-plane ZnO
M Zheng, Z Yin, Y Cheng, X Zhang, J Wu… - Applied Physics Letters, 2021 - pubs.aip.org
Metastable rhombohedral hafnia-based ferroelectric films are emerging as a promising
candidate in ferroelectric nonvolatile memory technologies, but the limited critical thickness …
candidate in ferroelectric nonvolatile memory technologies, but the limited critical thickness …
Small Signal Capacitance in Ferroelectric Hafnium Zirconium Oxide: Mechanisms and Physical Insights
This study presents a theoretical investigation of the physical mechanisms governing small
signal capacitance in ferroelectrics, focusing on Hafnium Zirconium Oxide (Hf0. 5Zr0. 5O2 …
signal capacitance in ferroelectrics, focusing on Hafnium Zirconium Oxide (Hf0. 5Zr0. 5O2 …
Enhanced remnant polarization in ferroelectric Hf0. 5Zr0. 5O2 thin film capacitors through Mo top electrode by post-metallization annealing treatment
Abstract Zr-doped HfO 2 (Hf 0.5 Zr 0.5 O 2) ferroelectric thin films have garnered
considerable attention due to their appealing attributes, including a large bandgap (> 5 eV) …
considerable attention due to their appealing attributes, including a large bandgap (> 5 eV) …
Crystallization of hafnium-oxide-based ferroelectrics for BEOL integration
We review the crystallization of hafnium-oxide-based ferroelectrics intended for back-end-of-
line (BEOL) integration. We discuss furnace, rapid thermal, and nanosecond Laser anneals …
line (BEOL) integration. We discuss furnace, rapid thermal, and nanosecond Laser anneals …
[PDF][PDF] Interface Modification and Characterization of Nanostructured Semiconductors: A Bridge to Contemporary Electronics
A Irish - 2024 - portal.research.lu.se
This research presents advancements into the fabrication, operation and characterization of
electronic nanomaterials and devices. It focuses on the interfaces of metals, oxides and …
electronic nanomaterials and devices. It focuses on the interfaces of metals, oxides and …