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Design for manufacturability and reliability in extreme-scaling VLSI
In the last five decades, the number of transistors on a chip has increased exponentially in
accordance with the Moore's law, and the semiconductor industry has followed this law as …
accordance with the Moore's law, and the semiconductor industry has followed this law as …
Simultaneous template optimization and mask assignment for DSA with multiple patterning
Block Copolymer Directed Self-Assembly (DSA) is a promising technique to print
contacts/vias for the 10nm technology node and beyond. By using hybrid lithography that …
contacts/vias for the 10nm technology node and beyond. By using hybrid lithography that …
STOMA: Simultaneous template optimization and mask assignment for directed self-assembly lithography with multiple patterning
Block copolymer directed self-assembly (DSA) is a promising technique to print contacts/vias
for the 10 nm technology node and beyond. By using hybrid lithography that incorporates …
for the 10 nm technology node and beyond. By using hybrid lithography that incorporates …
DTCO for DSA-MP hybrid lithography with double-BCP materials in sub-7nm node
In the sub-7nm technology nodes, as the mask cost for printing the dense via layers
increases dramatically with conventional lithography technique, industries are actively …
increases dramatically with conventional lithography technique, industries are actively …
Efficient dsa-dp hybrid lithography conflict detection and guiding template assignment
In recent years, directed self-assembly (DSA) has demonstrated tremendous potential to
reduce cost for multiple patterning with fewer masks, especially for via patterning. DSA is …
reduce cost for multiple patterning with fewer masks, especially for via patterning. DSA is …
[КНИГА][B] Enabling emerging lithography technologies with computer-aided design algorithms
J Kuang - 2016 - search.proquest.com
Lithography has been and will continue to be the backbone of the Integrated Circuit (IC)
industry to design reliable, smaller, faster and cheaper silicon systems. The continuous …
industry to design reliable, smaller, faster and cheaper silicon systems. The continuous …
Resolving spectrally similar landuse/landcover class conflict in remote sensing images using rough sets
VK Panchal, PC Saxena, B Deshmukh… - … Conference on Hybrid …, 2006 - ieeexplore.ieee.org
Major source of the geospatial information for a variety of applications including mission
critical analysis, land cover map**, etc. is the satellite based sensors facilitating different …
critical analysis, land cover map**, etc. is the satellite based sensors facilitating different …
Design for manufacturing with directed self-assembly lithography
J Ou - 2018 - repositories.lib.utexas.edu
In ultra-scaled very-large-scale integration (VLSI), lithography has become the bottleneck in
integrated circuit (IC) fabrication. Since the conventional 193nm immersion lithography has …
integrated circuit (IC) fabrication. Since the conventional 193nm immersion lithography has …
[ЦИТАТА][C] Design for manufacturability and reliability in extreme-scaling VLSI
YU Bei, DZ PAN - **科学: 信息科学 (英文版), 2016