Design for manufacturability and reliability in extreme-scaling VLSI

B Yu, X Xu, S Roy, Y Lin, J Ou, DZ Pan - Science China Information …, 2016 - Springer
In the last five decades, the number of transistors on a chip has increased exponentially in
accordance with the Moore's law, and the semiconductor industry has followed this law as …

Simultaneous template optimization and mask assignment for DSA with multiple patterning

J Kuang, J Ye, EFY Young - 2016 21st Asia and South Pacific …, 2016 - ieeexplore.ieee.org
Block Copolymer Directed Self-Assembly (DSA) is a promising technique to print
contacts/vias for the 10nm technology node and beyond. By using hybrid lithography that …

STOMA: Simultaneous template optimization and mask assignment for directed self-assembly lithography with multiple patterning

J Kuang, J Ye, EFY Young - IEEE Transactions on Computer …, 2017 - ieeexplore.ieee.org
Block copolymer directed self-assembly (DSA) is a promising technique to print contacts/vias
for the 10 nm technology node and beyond. By using hybrid lithography that incorporates …

DTCO for DSA-MP hybrid lithography with double-BCP materials in sub-7nm node

J Ou, X Xu, B Cline, G Yeric… - 2017 IEEE International …, 2017 - ieeexplore.ieee.org
In the sub-7nm technology nodes, as the mask cost for printing the dense via layers
increases dramatically with conventional lithography technique, industries are actively …

Efficient dsa-dp hybrid lithography conflict detection and guiding template assignment

J Ou, B Cline, G Yeric, DZ Pan - Design-Process-Technology …, 2017 - spiedigitallibrary.org
In recent years, directed self-assembly (DSA) has demonstrated tremendous potential to
reduce cost for multiple patterning with fewer masks, especially for via patterning. DSA is …

[КНИГА][B] Enabling emerging lithography technologies with computer-aided design algorithms

J Kuang - 2016 - search.proquest.com
Lithography has been and will continue to be the backbone of the Integrated Circuit (IC)
industry to design reliable, smaller, faster and cheaper silicon systems. The continuous …

Resolving spectrally similar landuse/landcover class conflict in remote sensing images using rough sets

VK Panchal, PC Saxena, B Deshmukh… - … Conference on Hybrid …, 2006 - ieeexplore.ieee.org
Major source of the geospatial information for a variety of applications including mission
critical analysis, land cover map**, etc. is the satellite based sensors facilitating different …

Design for manufacturing with directed self-assembly lithography

J Ou - 2018 - repositories.lib.utexas.edu
In ultra-scaled very-large-scale integration (VLSI), lithography has become the bottleneck in
integrated circuit (IC) fabrication. Since the conventional 193nm immersion lithography has …

[ЦИТАТА][C] Design for manufacturability and reliability in extreme-scaling VLSI

YU Bei, DZ PAN - **科学: 信息科学 (英文版), 2016