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[HTML][HTML] Atomic layer deposition frequency-multiplied Fresnel zone plates for hard x-rays focusing
The design and fabrication of Fresnel zone plates for hard x-ray focusing up to 25 keV
photon energies with better than 50 nm imaging half-pitch resolution is reported as …
photon energies with better than 50 nm imaging half-pitch resolution is reported as …
Metal‐assisted chemical etching for realisation of deep silicon microstructures
Metal‐assisted chemical etching process is exploited to realise deep‐etched silicon
structures. Gold as the noble metal, hydrogen peroxide and hydrofluoric acid solutions are …
structures. Gold as the noble metal, hydrogen peroxide and hydrofluoric acid solutions are …
Effect of a metal interlayer under Au catalyst for the preparation of microscale holes in Si substrate by metal-assisted chemical etching
T Shimizu, R Niwa, T Ito… - Japanese Journal of …, 2019 - iopscience.iop.org
Vertical microscale holes in Si (100) substrate were formed using a wet chemical method,
metal-assisted chemical etching (MacEtch), with patterned Au catalyst films. Three types of …
metal-assisted chemical etching (MacEtch), with patterned Au catalyst films. Three types of …
Nanofabrication and characterization of high-line-density x-ray transmission gratings
We report the nanofabrication and characterization of x-ray transmission gratings with a high
aspect ratio and a feature size of down to 65 nm. Two nanofabrication methods, the …
aspect ratio and a feature size of down to 65 nm. Two nanofabrication methods, the …
Fabrication of high aspect ratio structures in silicon independent of crystal orientation using metal assisted etching
Metal assisted etching is a technique which can be used to etch high aspect ratio structures
in silicon (Si) and has application in areas including solar cells, MEMS devices and the …
in silicon (Si) and has application in areas including solar cells, MEMS devices and the …
Nanowires fine tunable fabrication by varying the concentration ratios, the etchant and the plating spices in metal-assisted chemical etching of silicon wafer.
The metal-assisted chemical etching (MACE) was used to synthesis silicon nanowires. The
effect of etchant concentration, etching and chemical plating time and do** density on …
effect of etchant concentration, etching and chemical plating time and do** density on …
Block copolymer lithography and transferred patterns on the substrate used for SERS
The hexagonally ordered patterns by self-assembly of block copolymer with diameter and
spacing down to 23 nm and 15 nm, respectively, are capable of producing Si nanopores …
spacing down to 23 nm and 15 nm, respectively, are capable of producing Si nanopores …