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Silicon Oxide (SiOx): A Promising Material for Resistance Switching?
Interest in resistance switching is currently growing apace. The promise of novel high‐
density, low‐power, high‐speed nonvolatile memory devices is appealing enough, but …
density, low‐power, high‐speed nonvolatile memory devices is appealing enough, but …
From MTJ device to hybrid CMOS/MTJ circuits: A review
Spintronics is one of the growing research areas which has the capability to overcome the
issues of static power dissipation and volatility suffered by the complementary metal-oxide …
issues of static power dissipation and volatility suffered by the complementary metal-oxide …
Time dependent dielectric breakdown physics–Models revisited
JW McPherson - Microelectronics Reliability, 2012 - Elsevier
Time-Dependent Dielectric Breakdown (TDDB) models for silica (SiO2)-based dielectrics
are revisited so as to better understand the ability of each model to explain quantitatively the …
are revisited so as to better understand the ability of each model to explain quantitatively the …
Modeling early breakdown failures of gate oxide in SiC power MOSFETs
One of the most serious technology roadblocks for SiC DMOSFETs is the significant
occurrence of early failures in time-dependent-dielectric-breakdown testing. Conventional …
occurrence of early failures in time-dependent-dielectric-breakdown testing. Conventional …
A path-size weibit stochastic user equilibrium model
S Kitthamkesorn, A Chen - Procedia-Social and Behavioral Sciences, 2013 - Elsevier
The aim of this paper is to develop a path-size weibit (PSW) route choice model with an
equivalent mathematical programming (MP) formulation under the stochastic user …
equivalent mathematical programming (MP) formulation under the stochastic user …
Modified ramped current stress technique for monitoring thin dielectrics reliability and charge degradation
DV Andreev, VM Maslovsky, VV Andreev… - … status solidi (a), 2022 - Wiley Online Library
Herein, a novel technique to monitor the quality and reliability of thin nano‐scale dielectric
films is suggested. The method is based on the modification of the current stress technique …
films is suggested. The method is based on the modification of the current stress technique …
Influence of frequency and gamma irradiation on the electrical characteristics of Er2O3, Gd2O3, Yb2O3, and HfO2 MOS-based devices
The unique physical, chemical, and electronic properties of rare earth oxides have been of
immense interest to replace SiO 2 as a dielectric material in metal–oxide–semiconductor …
immense interest to replace SiO 2 as a dielectric material in metal–oxide–semiconductor …
Nanopore Formation via Tip‐Controlled Local Breakdown Using an Atomic Force Microscope
The dielectric breakdown approach for forming nanopores has greatly accelerated the pace
of research in solid‐state nanopore sensing, enabling inexpensive formation of nanopores …
of research in solid‐state nanopore sensing, enabling inexpensive formation of nanopores …
[HTML][HTML] Use of high-field electron injection into dielectrics to enhance functional capabilities of radiation MOS sensors
DV Andreev, GG Bondarenko, VV Andreev… - Sensors, 2020 - mdpi.com
The paper suggests a design of radiation sensors based on metal-oxide-semiconductor
(MOS) structures and p-channel radiation sensitive field effect transistors (RADFET) which …
(MOS) structures and p-channel radiation sensitive field effect transistors (RADFET) which …
Research on the Evolution of Defects Initiation and the Diffusion of Dopant on the Si/SiO2 Interface
Y Yang, D Chen, D Li, T Zhao, W Zhang… - Advanced Materials …, 2024 - Wiley Online Library
Si/SiO2 interfaces, important parts of Si‐based devices, significantly influence the
performance of Si‐based devices. However, owing to the impact of the external …
performance of Si‐based devices. However, owing to the impact of the external …