Silicon Oxide (SiOx): A Promising Material for Resistance Switching?

A Mehonic, AL Shluger, D Gao, I Valov… - Advanced …, 2018 - Wiley Online Library
Interest in resistance switching is currently growing apace. The promise of novel high‐
density, low‐power, high‐speed nonvolatile memory devices is appealing enough, but …

From MTJ device to hybrid CMOS/MTJ circuits: A review

VK Joshi, P Barla, S Bhat, BK Kaushik - IEEE Access, 2020 - ieeexplore.ieee.org
Spintronics is one of the growing research areas which has the capability to overcome the
issues of static power dissipation and volatility suffered by the complementary metal-oxide …

Time dependent dielectric breakdown physics–Models revisited

JW McPherson - Microelectronics Reliability, 2012 - Elsevier
Time-Dependent Dielectric Breakdown (TDDB) models for silica (SiO2)-based dielectrics
are revisited so as to better understand the ability of each model to explain quantitatively the …

Modeling early breakdown failures of gate oxide in SiC power MOSFETs

Z Chbili, A Matsuda, J Chbili, JT Ryan… - … on Electron Devices, 2016 - ieeexplore.ieee.org
One of the most serious technology roadblocks for SiC DMOSFETs is the significant
occurrence of early failures in time-dependent-dielectric-breakdown testing. Conventional …

A path-size weibit stochastic user equilibrium model

S Kitthamkesorn, A Chen - Procedia-Social and Behavioral Sciences, 2013 - Elsevier
The aim of this paper is to develop a path-size weibit (PSW) route choice model with an
equivalent mathematical programming (MP) formulation under the stochastic user …

Modified ramped current stress technique for monitoring thin dielectrics reliability and charge degradation

DV Andreev, VM Maslovsky, VV Andreev… - … status solidi (a), 2022 - Wiley Online Library
Herein, a novel technique to monitor the quality and reliability of thin nano‐scale dielectric
films is suggested. The method is based on the modification of the current stress technique …

Influence of frequency and gamma irradiation on the electrical characteristics of Er2O3, Gd2O3, Yb2O3, and HfO2 MOS-based devices

A Kahraman, SC Deevi, E Yilmaz - Journal of Materials Science, 2020 - Springer
The unique physical, chemical, and electronic properties of rare earth oxides have been of
immense interest to replace SiO 2 as a dielectric material in metal–oxide–semiconductor …

Nanopore Formation via Tip‐Controlled Local Breakdown Using an Atomic Force Microscope

Y Zhang, Y Miyahara, N Derriche, W Yang… - Small …, 2019 - Wiley Online Library
The dielectric breakdown approach for forming nanopores has greatly accelerated the pace
of research in solid‐state nanopore sensing, enabling inexpensive formation of nanopores …

[HTML][HTML] Use of high-field electron injection into dielectrics to enhance functional capabilities of radiation MOS sensors

DV Andreev, GG Bondarenko, VV Andreev… - Sensors, 2020 - mdpi.com
The paper suggests a design of radiation sensors based on metal-oxide-semiconductor
(MOS) structures and p-channel radiation sensitive field effect transistors (RADFET) which …

Research on the Evolution of Defects Initiation and the Diffusion of Dopant on the Si/SiO2 Interface

Y Yang, D Chen, D Li, T Zhao, W Zhang… - Advanced Materials …, 2024 - Wiley Online Library
Si/SiO2 interfaces, important parts of Si‐based devices, significantly influence the
performance of Si‐based devices. However, owing to the impact of the external …