Effects of reaction kinetics on the microstructure of chemical vapour deposited copper films: experiment and simulation
J Goswami, SA Shivashankar, G Anathakrishna - Thin Solid Films, 1997 - Elsevier
The microstructure of chemical vapour deposited copper films was studied using two
different metalorganic precursors, namely bis (dipivaloylmethanato) Cu (II) or Cu (dpm) 2 …
different metalorganic precursors, namely bis (dipivaloylmethanato) Cu (II) or Cu (dpm) 2 …
Monte Carlo simulation of nucleation and growth of thin films
J Goswami, G Ananthakrishna… - Bulletin of Materials …, 1997 - Springer
We study thin film growth using a lattice-gas, solid-on-solid model employing the Monte
Carlo technique. The model is applied to chemical vapour deposition (CVD) by including the …
Carlo technique. The model is applied to chemical vapour deposition (CVD) by including the …
Fe-Ni invar alloy: an example of fractal decomposition?
C Abromeit, G Ananthakrishna - Вопросы атомной науки и …, 2005 - dspace.nbuv.gov.ua
The important experimental results of irradiated and unirradiated Ni-Fe alloys and some
approaches to explain the various contradictory behaviours are discussed. We outline the …
approaches to explain the various contradictory behaviours are discussed. We outline the …