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[HTML][HTML] Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics
Many different gas discharges and plasmas exhibit bistable states under a given set of
conditions, and the history-dependent hysteresis that is manifested by intensive quantities of …
conditions, and the history-dependent hysteresis that is manifested by intensive quantities of …
Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect
Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
[HTML][HTML] Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias
Atomic layer etching (ALE), a cyclic process of surface modification and removal of the
modified layer, is an emerging damage-less etching technology for semiconductor …
modified layer, is an emerging damage-less etching technology for semiconductor …
Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in
the synthesis of nanoscale films with precise growth control. Apart from the well-established …
the synthesis of nanoscale films with precise growth control. Apart from the well-established …
Precise ion energy control with tailored waveform biasing for atomic scale processing
Anisotropic plasma-enhanced atomic layer etching (ALE) requires directional ions with a
well-defined ion energy to remove materials in a highly selective and self-limiting fashion. In …
well-defined ion energy to remove materials in a highly selective and self-limiting fashion. In …
Fundamental study towards a better understanding of low pressure radio-frequency plasmas for industrial applications
YX Liu, QZ Zhang, K Zhao, YR Zhang, F Gao… - Chinese …, 2022 - iopscience.iop.org
Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …
Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4
The power absorption dynamics of electrons and the electrical asymmetry effect in
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …
The effect of the driving frequencies on the electrical asymmetry of dual-frequency capacitively coupled plasmas
In capacitively coupled radio frequency discharges driven by two consecutive phase-locked
harmonics, the electrical asymmetry effect (EAE) allows one to generate a dc self-bias as a …
harmonics, the electrical asymmetry effect (EAE) allows one to generate a dc self-bias as a …
Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge
We show experimental observations of collisionless electron heating by the combinations of
the capacitive radio frequency (RF) bias power and the inductive power in low argon gas …
the capacitive radio frequency (RF) bias power and the inductive power in low argon gas …
The electrical asymmetry effect in geometrically asymmetric capacitive radio frequency plasmas
The electrical asymmetry effect (EAE) allows an almost ideal separate control of the mean
ion energy,< E i>, and flux, Γ i, at the electrodes in capacitive radio frequency discharges …
ion energy,< E i>, and flux, Γ i, at the electrodes in capacitive radio frequency discharges …