Numerical study of JAM-GS-GAA FinFET: a Fin aspect ratio optimization for upgraded analog and intermodulation distortion performance

B Kumar, R Chaujar - Silicon, 2022 - Springer
This paper optimizes the fin aspect ratio (AR) of Junctionless Accumulation Mode Gate Stack
Gate All Around (JAM-GS-GAA) FinFET with constant conducting channel area for upgraded …

Optimization of high-k and gate metal workfunction for improved analog and intermodulation performance of Gate Stack (GS)-GEWE-SiNW MOSFET

N Gupta, R Chaujar - Superlattices and Microstructures, 2016 - Elsevier
This work optimizes the gate engineering scheme (both gate stack and gate metal
workfunction engineering) of Stacked Gate (SG) Gate Electrode Workfunction Engineered …

Performance assessment of high-k soi gan finfet with different fin aspect ratio for rf/wireless applications

VS Rajawat, B Choudhary, A Kumar - Wireless Personal Communications, 2024 - Springer
This paper proposes High-k SOI GaN FinFET which is a potential candidate for more
efficient and high-performance electronic devices attributable to high carrier mobility and …

Investigation of temperature variations on analog/RF and linearity performance of stacked gate GEWE-SiNW MOSFET for improved device reliability

N Gupta, R Chaujar - Microelectronics Reliability, 2016 - Elsevier
In this paper, reliability issues of Stacked Gate (SG)-Gate Electrode Workfunction
Engineered (GEWE)-Silicon Nanowire (SiNW) MOSFET is examined over a wide range of …

Impact of noise and interface trap charge on a heterojunction dual-gate vertical TFET device

K Nasani, B Bhowmick, PD Pukhrambam - Journal of Electronic Materials, 2024 - Springer
Herein, a vertical T-shaped heterojunction tunnel field-effect transistor (TFET) structure is
proposed. This paper explores the effect of the traps and noise on the electrical …

Impact of temperature on linearity and harmonic distortion characteristics of underlapped FinFET

A Dutta, K Koley, SK Saha, CK Sarkar - Microelectronics Reliability, 2016 - Elsevier
In this paper, the performance of asymmetric underlapped FinFETs (U-FinFETs) is analyzed
for linearity and harmonic distortion at high temperatures. The harmonic distortion that arises …

Linearity Analysis of Charge Plasma-Induced Graded Channel Nanotube at Varying Temperatures

D Vaithiyanathan, B Raj - 2023 International Conference on …, 2023 - ieeexplore.ieee.org
Silicon-based Graded Channel Nanotube MOSFET (GC-NTFET) has been analyzed for the
change its surrounding temperature brings in its linearity performance. In this research …

Harmonic distortion analysis of triple gate SOI nanowire MOSFETS down to 100 K

BC Paz, RT Doria, M Cassé, S Barraud… - Microelectronics …, 2017 - Elsevier
The linearity of triple gate nanowire transistors (NWs) implemented on a Silicon-On-Insulator
(SOI) substrate is investigated in this work considering temperature (T) influence. The …

Analytical modelling of threshold voltage for underlap Fully Depleted Silicon-On-Insulator MOSFET

R Sharma, AK Rana - International Journal of Electronics, 2017 - Taylor & Francis
In this article, surface-potential-based analytical threshold voltage model for underlap Fully
Depleted Silicon-On-Insulator MOSFET (underlap-SOI) is developed by solving two …

Analysis of noise performance in InAs DG-MOSHEMT

S Tamilselvi, S Tamilarasi… - 2017 Devices for …, 2017 - ieeexplore.ieee.org
In this paper the noise performance of double gate (DG) InAs MOS-HEMT with AI2O3
dielectric has been studied. In semiconductor devices noise occurs at near or critical …