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Recent advances of photodetection technology based on main group III–V semiconductors
J Ai, M Qin, M Xue, C Cao, J Zhang… - Advanced Functional …, 2024 - Wiley Online Library
The rapid advancement of main group III–V nanomaterials endows photodetectors (PDs)
with enhanced performance. At present, various III–V nanomaterials are systematically …
with enhanced performance. At present, various III–V nanomaterials are systematically …
The structure and properties of metal-semiconductor interfaces
LJ Brillson - Surface Science Reports, 1982 - Elsevier
In this review, we examine the contributions of surface science research to the
understanding of metal-semiconductor interfaces. In particular, we survey conventional …
understanding of metal-semiconductor interfaces. In particular, we survey conventional …
[KIRJA][B] Handbook of thin film deposition techniques principles, methods, equipment and applications, second editon
K Seshan - 2002 - taylorfrancis.com
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and
Applications, Second Edition explores the technology behind the spectacular growth in the …
Applications, Second Edition explores the technology behind the spectacular growth in the …
High electron mobility InAs nanowire field‐effect transistors
Abstract Single‐crystal InAs nanowires (NWs) are synthesized using metal–organic
chemical vapor deposition (MOCVD) and fabricated into NW field‐effect transistors …
chemical vapor deposition (MOCVD) and fabricated into NW field‐effect transistors …
A review of the metal–GaN contact technology
QZ Liu, SS Lau - Solid-State Electronics, 1998 - Elsevier
In this paper, we review the metal–GaN contact technology to shed light on some of the
critical issues such as GaN surface cleaning for metallization, Schottky barrier formation to …
critical issues such as GaN surface cleaning for metallization, Schottky barrier formation to …
A survey of ohmic contacts to III-V compound semiconductors
A survey of ohmic contact materials and properties to GaAs, InP, GaN will be presented
along with critical issues pertaining to each semiconductor material. Au-based alloys (eg …
along with critical issues pertaining to each semiconductor material. Au-based alloys (eg …
Intrinsic electron accumulation layers on reconstructed clean InAs (100) surfaces
M Noguchi, K Hirakawa, T Ikoma - Physical review letters, 1991 - APS
The electronic structures of clean InAs (100) surfaces have been investigated by in situ high-
resolution electron-energy-loss spectroscopy. Intrinsic electron accumulation layers with …
resolution electron-energy-loss spectroscopy. Intrinsic electron accumulation layers with …
[KIRJA][B] High temperature electronics
FP McCluskey, T Podlesak, R Grzybowski - 2018 - taylorfrancis.com
The development of electronics that can operate at high temperatures has been identified as
a critical technology for the next century. Increasingly, engineers will be called upon to …
a critical technology for the next century. Increasingly, engineers will be called upon to …
[KIRJA][B] The handbook of photonics
Reflecting changes in the field in the ten years since the publication of the first edition, The
Handbook of Photonics, Second Edition explores recent advances that have affected this …
Handbook of Photonics, Second Edition explores recent advances that have affected this …
Quasistatic and high frequency capacitance–voltage characterization of Ga2O3–GaAs structures fabricated by in situ molecular beam epitaxy
Interface properties of Ga2O3–GaAs structures fabricated using in situ multiple‐chamber
molecular beam epitaxy have been investigated. The oxide films were deposited on clean …
molecular beam epitaxy have been investigated. The oxide films were deposited on clean …