AI/ML algorithms and applications in VLSI design and technology

D Amuru, A Zahra, HV Vudumula, PK Cherupally… - Integration, 2023 - Elsevier
An evident challenge ahead for the integrated circuit (IC) industry is the investigation and
development of methods to reduce the design complexity ensuing from growing process …

A survey on machine and deep learning in semiconductor industry: methods, opportunities, and challenges

AC Huang, SH Meng, TJ Huang - Cluster Computing, 2023 - Springer
The technology of big data analysis and artificial intelligence deep learning has been
actively cross-combined with various fields to increase the effect of its original low single …

[HTML][HTML] Machine learning for semiconductors

DY Liu, LM Xu, XM Lin, X Wei, WJ Yu, Y Wang, ZM Wei - Chip, 2022 - Elsevier
Thanks to the increasingly high standard of electronics, the semiconductor material science
and semiconductor manufacturing have been booming in the last few decades, with massive …

Machine learning-based edge placement error analysis and optimization: a systematic review

AT Ngo, B Dey, S Halder, S De Gendt… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
As the semiconductor manufacturing process is moving towards the 3 nm node, there is a
crucial need to reduce the edge placement error (EPE) to ensure proper functioning of the …

Machine learning prediction model for automation equipment control in semiconductor manufacturing

AA Bakar - 2022 IEEE 39th International Electronics …, 2022 - ieeexplore.ieee.org
The conventional control systems in semiconductor manufacturing today typically depend on
humans to monitor the performance of their equipment. Not only is this method performed …

GAGAN: Global Attention Generative Adversarial Networks for Semiconductor Advanced Process Control

HH Hsiao, KJ Wang - IEEE Transactions on Semiconductor …, 2023 - ieeexplore.ieee.org
This paper addresses the quality control of the photolithography process in the
semiconductor industry. Overlay errors in the process seriously affect the wafer yield, and …

Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning

Y **, T Kozawa - Japanese Journal of Applied Physics, 2022 - iopscience.iop.org
As key steps of lithography, the development of resist materials and the exploration of new
materials are important to meet market demands from the semiconductor industry. During …

OPC accuracy improvement through deep-learning based etch model

W Shi, L Zhu, Y Chen, J Huang, J Wang… - Advanced Etch …, 2022 - spiedigitallibrary.org
This paper demonstrates a full-chip OPC correction flow based on deep-learning etch model
in a DUV litho-etch case. The flow leverages SEM metrology (eP5 fast E-beam tool, ASML …

Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction

MSE Habib, HAH Fahmy, MF Abu-ElYazeed - arxiv preprint arxiv …, 2024 - arxiv.org
Optical lithography is the main enabler to semiconductor manufacturing. It requires
extensive processing to perform the Resolution Enhancement Techniques (RETs) required …

A novel approach to etch-process-aware intensive layout retarget

J Lee, Y Heo, R Lee, S Kim, J Hong… - Advanced Etch …, 2023 - spiedigitallibrary.org
Patterning, a major process in semiconductor manufacturing, aims to transfer the design
layout to the wafer. Accordingly, the" process proximity correction" method was developed to …