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AI/ML algorithms and applications in VLSI design and technology
An evident challenge ahead for the integrated circuit (IC) industry is the investigation and
development of methods to reduce the design complexity ensuing from growing process …
development of methods to reduce the design complexity ensuing from growing process …
A survey on machine and deep learning in semiconductor industry: methods, opportunities, and challenges
AC Huang, SH Meng, TJ Huang - Cluster Computing, 2023 - Springer
The technology of big data analysis and artificial intelligence deep learning has been
actively cross-combined with various fields to increase the effect of its original low single …
actively cross-combined with various fields to increase the effect of its original low single …
[HTML][HTML] Machine learning for semiconductors
DY Liu, LM Xu, XM Lin, X Wei, WJ Yu, Y Wang, ZM Wei - Chip, 2022 - Elsevier
Thanks to the increasingly high standard of electronics, the semiconductor material science
and semiconductor manufacturing have been booming in the last few decades, with massive …
and semiconductor manufacturing have been booming in the last few decades, with massive …
Machine learning-based edge placement error analysis and optimization: a systematic review
As the semiconductor manufacturing process is moving towards the 3 nm node, there is a
crucial need to reduce the edge placement error (EPE) to ensure proper functioning of the …
crucial need to reduce the edge placement error (EPE) to ensure proper functioning of the …
Machine learning prediction model for automation equipment control in semiconductor manufacturing
AA Bakar - 2022 IEEE 39th International Electronics …, 2022 - ieeexplore.ieee.org
The conventional control systems in semiconductor manufacturing today typically depend on
humans to monitor the performance of their equipment. Not only is this method performed …
humans to monitor the performance of their equipment. Not only is this method performed …
GAGAN: Global Attention Generative Adversarial Networks for Semiconductor Advanced Process Control
HH Hsiao, KJ Wang - IEEE Transactions on Semiconductor …, 2023 - ieeexplore.ieee.org
This paper addresses the quality control of the photolithography process in the
semiconductor industry. Overlay errors in the process seriously affect the wafer yield, and …
semiconductor industry. Overlay errors in the process seriously affect the wafer yield, and …
Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning
Y **, T Kozawa - Japanese Journal of Applied Physics, 2022 - iopscience.iop.org
As key steps of lithography, the development of resist materials and the exploration of new
materials are important to meet market demands from the semiconductor industry. During …
materials are important to meet market demands from the semiconductor industry. During …
OPC accuracy improvement through deep-learning based etch model
W Shi, L Zhu, Y Chen, J Huang, J Wang… - Advanced Etch …, 2022 - spiedigitallibrary.org
This paper demonstrates a full-chip OPC correction flow based on deep-learning etch model
in a DUV litho-etch case. The flow leverages SEM metrology (eP5 fast E-beam tool, ASML …
in a DUV litho-etch case. The flow leverages SEM metrology (eP5 fast E-beam tool, ASML …
Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction
MSE Habib, HAH Fahmy, MF Abu-ElYazeed - arxiv preprint arxiv …, 2024 - arxiv.org
Optical lithography is the main enabler to semiconductor manufacturing. It requires
extensive processing to perform the Resolution Enhancement Techniques (RETs) required …
extensive processing to perform the Resolution Enhancement Techniques (RETs) required …
A novel approach to etch-process-aware intensive layout retarget
J Lee, Y Heo, R Lee, S Kim, J Hong… - Advanced Etch …, 2023 - spiedigitallibrary.org
Patterning, a major process in semiconductor manufacturing, aims to transfer the design
layout to the wafer. Accordingly, the" process proximity correction" method was developed to …
layout to the wafer. Accordingly, the" process proximity correction" method was developed to …