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[HTML][HTML] Reliability, applications and challenges of GaN HEMT technology for modern power devices: A review
A new generation of high-efficiency power devices is being developed using wide bandgap
(WBG) semiconductors, like GaN and SiC, which are emerging as attractive alternatives to …
(WBG) semiconductors, like GaN and SiC, which are emerging as attractive alternatives to …
Electronic surface and dielectric interface states on GaN and AlGaN
GaN and AlGaN have shown great potential in next-generation high-power electronic
devices; however, they are plagued by a high density of interface states that affect device …
devices; however, they are plagued by a high density of interface states that affect device …
CMOS process-compatible high-power low-leakage AlGaN/GaN MISHEMT on silicon
M Van Hove, S Boulay, SR Bahl… - IEEE Electron …, 2012 - ieeexplore.ieee.org
We report on a novel Au-free CMOS process-compatible process for AlGaN/GaN metal-
insulator-semiconductor high-electron-mobility transistors. The process starts from a 150 …
insulator-semiconductor high-electron-mobility transistors. The process starts from a 150 …
Electrical properties of atomic layer deposited aluminum oxide on gallium nitride
We report on our investigation of the electrical properties of metal/Al 2 O 3/GaN metal-
insulator-semiconductor capacitors. We determined the conduction band offset and interface …
insulator-semiconductor capacitors. We determined the conduction band offset and interface …
Reverse leakage and breakdown mechanisms of vertical GaN-on-Si Schottky barrier diodes with and without implanted termination
X Guo, Y Zhong, X Chen, Y Zhou, S Su, S Yan… - Applied Physics …, 2021 - pubs.aip.org
This Letter studies the reverse leakage and breakdown mechanisms of vertical GaN-on-Si
Schottky barrier diodes (SBDs) with and without argon-implanted termination (ArIT). The …
Schottky barrier diodes (SBDs) with and without argon-implanted termination (ArIT). The …
Low-loss and high-voltage III-nitride transistors for power switching applications
M Kuzuhara, H Tokuda - IEEE Transactions on Electron …, 2014 - ieeexplore.ieee.org
This paper describes recent technological advances on III-nitride-based transistors for
power switching applications. Focuses are placed on the progress toward enhancing the …
power switching applications. Focuses are placed on the progress toward enhancing the …
Reverse leakage analysis for as-grown and regrown vertical GaN-on-GaN Schottky barrier diodes
Vertical GaN-on-GaN Schottky barrier diodes based on as-grown and regrown samples
were fabricated to investigate the effects of the etch-then-regrow process on device …
were fabricated to investigate the effects of the etch-then-regrow process on device …
Status of aluminum oxide gate dielectric technology for insulated-gate GaN-based devices
A Calzolaro, T Mikolajick, A Wachowiak - Materials, 2022 - mdpi.com
Insulated-gate GaN-based transistors can fulfill the emerging demands for the future
generation of highly efficient electronics for high-frequency, high-power and high …
generation of highly efficient electronics for high-frequency, high-power and high …
MOSFETs on (110) C–H diamond: ALD Al₂O₃/diamond interface analysis and high performance normally-OFF operation realization
B Liu, T Bi, Y Fu, K Kudara, S Imanishi… - … on Electron Devices, 2022 - ieeexplore.ieee.org
Hole concentration of 2-D hole gas (2DHG) on (110) diamond is higher than that on other
faces, making it the best choice for power device application. Detailed analysis of atomic …
faces, making it the best choice for power device application. Detailed analysis of atomic …
[HTML][HTML] Design and analysis of 10 nm T-gate enhancement-mode MOS-HEMT for high power microwave applications
In this work, we propose a novel enhancement-mode GaN metal-oxide-semiconductor high
electron mobility transistor (MOS-HEMT) with a 10 nm T-gate length and a high-k TiO 2 gate …
electron mobility transistor (MOS-HEMT) with a 10 nm T-gate length and a high-k TiO 2 gate …