Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Control of the nucleation behavior during atomic layer deposition (ALD) of metals is of great
importance for the deposition of metallic thin films and nanoparticles, and for nanopatterning …

Atomic layer deposition (ALD) processes of noble metals are gaining increasing interest for
applications in catalysis and microelectronics. Platinum ALD from (methylcyclopentadienyl) …

Controlling the morphology of noble metal nanoparticles during surface depositions is
strongly influenced by precursor–substrate and precursor–deposit interactions. Depositions …

The formation of Pt nanowires (NWs) by atomic layer deposition on highly ordered pyrolytic
graphite (HOPG) is investigated. Pt is deposited only at the step edges of HOPG and not on …

For over 20 years, atomic layer deposition (ALD) of platinum (Pt) has gained significant
achievements in the fabrication of a variety of Pt nanostructures for applications in different …

The effects of TiO2 microstructure on Pt nucleation and on formation of continuous ultrathin
Pt films by atomic layer deposition (ALD) were investigated. Pt was deposited by a …

The ability to deposit thin and conformal films has become of great importance because of
downscaling of devices. However, because of nucleation difficulty, depositing an electrically …

Platinum (Pt) atomic layer deposition (ALD) usually yields Pt nanoparticles during initial film
growth. In contrast, deposition of continuous and ultrathin Pt films is needed for many …

Functional nanoporous materials are promising for a number of applications ranging from
selective biofiltration to fuel cell electrodes. This work reports the functionalization of …