Advanced materials for thin‐film solid oxide fuel cells: recent progress and challenges in boosting the device performance at low temperatures

J Zhang, C **a, Y Mi, B Wang, B Lin, G Chen, B Zhu - Nature communications, 2019 - nature.com
Interest in low-temperature operation of solid oxide fuel cells is growing. Recent advances in
perovskite phases have resulted in an efficient H+/O2-/e-triple-conducting electrode BaCo0 …

[HTML][HTML] A brief review of atomic layer deposition: from fundamentals to applications

RW Johnson, A Hultqvist, SF Bent - Materials today, 2014 - Elsevier
Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of
a variety of materials. Based on sequential, self-limiting reactions, ALD offers exceptional …

Synthesis of doped, ternary, and quaternary materials by atomic layer deposition: a review

AJM Mackus, JR Schneider, C MacIsaac… - Chemistry of …, 2018 - ACS Publications
In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Challenges and advancement in direct ammonia solid oxide fuel cells: a review

DS Dhawale, S Biswas, G Kaur… - Inorganic Chemistry …, 2023 - pubs.rsc.org
Finding solutions to tackle climate change and decarbonizing the energy sector are
emerging as significant challenges for the global community. Carbon dioxide (CO2) …

Comprehensive review of methane conversion in solid oxide fuel cells: prospects for efficient electricity generation from natural gas

TM Gür - Progress in Energy and Combustion Science, 2016 - Elsevier
Natural gas is an important energy resource for electric power generation and other energy
needs. Recent discoveries of vast reserves of shale gas greatly increased its abundance …

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

V Miikkulainen, M Leskelä, M Ritala… - Journal of Applied …, 2013 - pubs.aip.org
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …