Selectively nitrogen doped ALD-IGZO TFTs with extremely high mobility and reliability

DG Kim, H Choi, YS Kim, DH Lee, HJ Oh… - … Applied Materials & …, 2023 - ACS Publications
Achieving high mobility and reliability in atomic layer deposition (ALD)-based IGZO thin-film
transistors (TFTs) with an amorphous phase is vital for practical applications in relevant …

Atomic Layer Deposition of WO3-Doped In2O3 for Reliable and Scalable BEOL-Compatible Transistors

C Yoo, J Hartanto, B Saini, W Tsai, V Thampy… - Nano Letters, 2024 - ACS Publications
Tungsten oxide (WO3) doped indium oxide (IWO) field-effect transistors (FET), synthesized
using atomic layer deposition (ALD) for three-dimensional integration and back-end-of-line …

Epitaxial PZT film-based ferroelectric field-effect transistors for artificial synapse

Y Jo, JY Lee, E Park, HS Kim, HJ Choi… - ACS Applied …, 2023 - ACS Publications
Neuromorphic computing systems that mimic the human brain have recently attracted
substantial attention because they allow for the efficient processing of large amounts of data …

A review of doped metal oxide semiconductors in the stability of thin film transistors

Z Liang, W Wu, Z Fang, Z Deng, X Fu, H Ning… - Journal of Alloys and …, 2024 - Elsevier
With the development of the times, people have higher and higher requirements for
electronic components. Thin film transistor (TFT) is an important switching device that has …

Mechanism analysis of ultralow leakage and abnormal instability in InGaZnO thin-film transistor toward DRAM

G Yan, H Yang, W Liu, N Zhou, Y Hu… - … on Electron Devices, 2022 - ieeexplore.ieee.org
In this article, mechanisms of extremely low OFF-state current and abnormal negative bias
stress (NBS) are systematically investigated by the varying process that contains various gas …

Self-Aligned Top-Gate Amorphous InGaZnO TFTs With Plasma Enhanced Chemical Vapor Deposited Sub-10 nm SiO2 Gate Dielectric for Low-Voltage Applications

Y Zhang, H Yang, H Peng, Y Cao… - IEEE Electron Device …, 2019 - ieeexplore.ieee.org
In this letter, self-aligned top-gate (SATG) amorphous In-Ga-Zn-O (a-IGZO) thin-film
transistors (TFTs) with an 8.62-nm SiO 2 gate dielectric grown by conventional plasma …

High-mobility amorphous InGaZnO thin-film transistors with nitrogen introduced via low-temperature annealing

Y Yu, N Lv, D Zhang, Y Wei… - IEEE Electron Device …, 2021 - ieeexplore.ieee.org
In this letter, the carrier mobility of amorphous InGaZnO (a-IGZO) thin-film transistor (TFT)
was remarkably enhanced by the introduction of nitrogen and the formation of Zn 3 N 2, in …

[HTML][HTML] Analysis of nitrogen-do** effect on sub-gap density of states in a-IGZO TFTs by TCAD simulation

Z Zhu, W Cao, X Huang, Z Shi, D Zhou, W Xu - Micromachines, 2022 - mdpi.com
In this work, the impact of nitrogen do** (N-do**) on the distribution of sub-gap states in
amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) is qualitatively analyzed by …

Top-gate amorphous indium-gallium-zinc-oxidethin-film transistors with magnesium metallized source/drain regions

H Peng, B Chang, H Fu, H Yang… - … on Electron Devices, 2020 - ieeexplore.ieee.org
Magnesium (Mg)-induced metallization of amorphous indium-gallium-zinc-oxide (a-IGZO)
films is investigated to develop a self-aligned (SA) top-gate (SATG) a-IGZO thin-film …

Effect of Back-Gate Dielectric on Indium Tin Oxide (ITO) Transistor Performance and Stability

A Daus, L Hoang, C Gilardi, S Wahid… - … on Electron Devices, 2023 - ieeexplore.ieee.org
Amorphous oxide semiconductors (AOSs) are receiving increased attention for electronics
requiring low fabrication temperatures, but concerns remain about their stability. Here, we …