Physics and technology of magnetron sputtering discharges

JT Gudmundsson - Plasma Sources Science and Technology, 2020‏ - iopscience.iop.org
Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

Plasma diagnostics for understanding the plasma–surface interaction in HiPIMS discharges: a review

N Britun, T Minea, S Konstantinidis… - Journal of Physics D …, 2014‏ - iopscience.iop.org
The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …

Quadrupole mass spectrometry of reactive plasmas

J Benedikt, A Hecimovic, D Ellerweg… - Journal of Physics D …, 2012‏ - iopscience.iop.org
Reactive plasmas are highly valued for their ability to produce large amounts of reactive
radicals and of energetic ions bombarding surrounding surfaces. The non-equilibrium …

High power impulse magnetron sputtering discharge

JT Gudmundsson, N Brenning, D Lundin… - Journal of vacuum …, 2012‏ - pubs.aip.org
The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

Comparison of tribological properties of nitrided Ti-N modified layer and deposited TiN coatings on TA2 pure titanium

L Zhang, M Shao, Z Wang, Z Zhang, Y He, J Yan… - Tribology …, 2022‏ - Elsevier
Little work has been reported directly compared to the tribological behavior of plasma
nitrided pure titanium and those coated with TiN coatings. This work prepared the compound …

[HTML][HTML] Bipolar HiPIMS for tailoring ion energies in thin film deposition

J Keraudy, RPB Viloan, MA Raadu, N Brenning… - Surface and Coatings …, 2019‏ - Elsevier
The effects of a positive pulse following a high-power impulse magnetron sputtering
(HiPIMS) pulse are studied using energy-resolved mass spectrometry. This includes …

[HTML][HTML] Improving the crystallinity and texture of oblique-angle-deposited AlN thin films using reactive synchronized HiPIMS

J Patidar, A Sharma, S Zhuk, G Lorenzin… - Surface and Coatings …, 2023‏ - Elsevier
Many technologies, such as surface-acoustic-wave (SAW) resonators, sensors, and
piezoelectric MEMS require highly-oriented and textured functional thin films. The best …

Particle-balance models for pulsed sputtering magnetrons

C Huo, D Lundin, JT Gudmundsson… - Journal of Physics D …, 2017‏ - iopscience.iop.org
The time-dependent plasma discharge ionization region model (IRM) has been under
continuous development during the past decade and used in several studies of the …

Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at …

KA Aissa, A Achour, J Camus, L Le Brizoual, PY Jouan… - Thin Solid Films, 2014‏ - Elsevier
Aluminium nitride (AlN) films were deposited by dc magnetron sputtering (dcMS) and high
power impulse magnetron sputtering (HiPIMS) on (100) oriented silicon (Si) substrates, in Ar …

Comparison of Al–Si–N nanocomposite coatings deposited by HIPIMS and DC magnetron sputtering

E Lewin, D Loch, A Montagne, AP Ehiasarian… - Surface and coatings …, 2013‏ - Elsevier
This paper presents a comparative study between DC magnetron sputtering (DCMS) and
high power impulse magnetron sputtering (HIPIMS) of Al–Si–N. Coatings were synthesised …