This study examines the utilization of machine learning methodologies and multi-factor
authentication (MFA) to bolster network security, specifically targeting network intrusion …

Continuous scaling of the VLSI system leaves a great challenge on manufacturing, thus
optical proximity correction (OPC) is widely applied in conventional design flow for …

Recent years have seen increasing employment of decision intelligence in electronic design
automation (EDA), which aims to reduce the manual efforts and boost the design closure …

Optical proximity correction (OPC) in modern design closures has become extremely
expensive and challenging. Conventional model-based OPC encounters performance …

Neural network-based inverse lithography technology (NNILT) has been used to improve
the computational efficiency of large-scale mask optimization for advanced …

Digital micromirror device (DMD)-based maskless projection lithography has gained
significant attention for its maskless, flexible, and cost-effective characteristics. However …

As the technology node of integrated circuits rapidly goes beyond 5nm, synthesis-centric
modern very large-scale integration (VLSI) design flow is facing ever-increasing design …

Due to the continuous shrinkage of transistor size and the ever-increasing complexity of
integrated circuit design layout, great challenges arise in optical lithography—any defect on …

Optical proximity correction (OPC) is currently a crucial technique for improving
photolithographic image quality, with its correctness and efficiency relying heavily on resist …

Semiconductor lithography is a key process for fabricating integrated circuits, but it suffers
from various distortions and variations that affect the quality of the printed patterns. Optical …