Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments

Z Donkó, J Schulze, U Czarnetzki… - Plasma Physics and …, 2012 - iopscience.iop.org
Capacitive radio frequency (RF) discharge plasmas have been serving hi-tech industry (eg
chip and solar cell manufacturing, realization of biocompatible surfaces) for several years …

Electromagnetic effects in high-frequency capacitive discharges used for plasma processing

P Chabert - Journal of Physics D: Applied Physics, 2007 - iopscience.iop.org
In plasma processing, capacitive discharges have classically been operated in the
electrostatic regime, for which the excitation wavelength λ is much greater than the electrode …

[KSIĄŻKA][B] Physics of radio-frequency plasmas

P Chabert, N Braithwaite - 2011 - books.google.com
Low-temperature radio frequency plasmas are essential in various sectors of advanced
technology, from micro-engineering to spacecraft propulsion systems and efficient sources …

Standing wave and skin effects in large-area, high-frequency capacitive discharges

MA Lieberman, JP Booth, P Chabert… - Plasma Sources …, 2002 - iopscience.iop.org
Large-area capacitive discharges driven at frequencies higher than the usual industrial
frequency of 13.56 MHz have attracted recent interest for materials etching and thin film …

On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric

BG Heil, U Czarnetzki, RP Brinkmann… - Journal of Physics D …, 2008 - iopscience.iop.org
A fundamental problem in technological plasmas has been how to control the ion energy
and the ion flux (plasma density) independently of one another. A simple, but previously …

eduPIC: an introductory particle based code for radio-frequency plasma simulation

Z Donkó, A Derzsi, M Vass, B Horváth… - Plasma Sources …, 2021 - iopscience.iop.org
Particle based simulations are indispensable tools for numerical studies of charged particle
swarms and low-temperature plasma sources. The main advantage of such approaches is …

PIC simulations of the separate control of ion flux and energy in CCRF discharges via the electrical asymmetry effect

Z Donkó, J Schulze, BG Heil… - Journal of Physics D …, 2008 - iopscience.iop.org
Recently a novel approach for achieving separate control of ion flux and energy in
capacitively coupled radio frequency (CCRF) discharges based on the electrical asymmetry …

The electrical asymmetry effect in capacitively coupled radio frequency discharges–measurements of dc self bias, ion energy and ion flux

J Schulze, E Schüngel… - Journal of Physics D …, 2009 - iopscience.iop.org
The recently theoretically predicted electrical asymmetry effect (EAE)(Heil et al 2008 IEEE
Trans. Plasma Sci. 36 1404, Heil et al 2008 J. Phys. D: Appl. Phys. 41 165202, Czarnetzki et …

Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms

B Bruneau, T Gans, D O'Connell, A Greb, EV Johnson… - Physical review …, 2015 - APS
The ionization dynamics in geometrically symmetric parallel plate capacitively coupled
plasmas driven by radio frequency tailored voltage waveforms is investigated using phase …

Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

T Gans, J Schulze, D O'connell, U Czarnetzki… - Applied physics …, 2006 - pubs.aip.org
An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch
reactor (Exelan®, Lam Research) has been modified for spatially resolved optical …