Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

This review article discusses the origins of self-assembly behavior of linear and non-linear
block co-and terpolymers and their application towards the fabrication of high-resolution …

This Perspective provides a critical analysis of the current knowledge concerning solvent
vapor annealing (SVA) of block polymer thin films. Herein, we identify key challenges that …

Lamellae-forming polystyrene-block-poly (methyl methacrylate)(PS-b-PMMA) films, with bulk
period L 0, were directed to assemble on lithographically nanopatterned surfaces. The …

Control over nanopore size and 3D structure is necessary to advance membrane
performance in ubiquitous separation devices. Here, inorganic nanoporous membranes are …

In this study, a series of perpendicular lamellae-forming poly (polyhedral oligomeric
silsesquioxane methacrylate-block-2, 2, 2-trifluoroethyl methacrylate) s (PMAPOSS-b …

The domain orientation and grain sizes in cylinder-forming poly (styrene-b-methyl
methacrylate)(PS-b-PMMA) films were systematically investigated as a function of film …

The orientation of cylinder-forming poly (styrene-block-methyl methacrylate)[P (Sb-MMA)]
was investigated on two sets of polymeric surface treatments: 10 para-substituted …

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation
lithography for semiconductors and a variety of soft materials. It is imperative to …

Fundamental understanding of the self-assembly of domains in block copolymers (BCPs)
and capabilities in control of these processes are important for their use as nanoscale …