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[HTML][HTML] State of the art and future perspectives in advanced CMOS technology
The international technology roadmap of semiconductors (ITRS) is approaching the
historical end point and we observe that the semiconductor industry is driving …
historical end point and we observe that the semiconductor industry is driving …
[HTML][HTML] Advanced grazing-incidence techniques for modern soft-matter materials analysis
A Hexemer, P Müller-Buschbaum - IUCrJ, 2015 - journals.iucr.org
The complex nano-morphology of modern soft-matter materials is successfully probed with
advanced grazing-incidence techniques. Based on grazing-incidence small-and wide-angle …
advanced grazing-incidence techniques. Based on grazing-incidence small-and wide-angle …
[HTML][HTML] Miniaturization of CMOS
HH Radamson, X He, Q Zhang, J Liu, H Cui, J **ang… - Micromachines, 2019 - mdpi.com
When the international technology roadmap of semiconductors (ITRS) started almost five
decades ago, the metal oxide effect transistor (MOSFET) as units in integrated circuits (IC) …
decades ago, the metal oxide effect transistor (MOSFET) as units in integrated circuits (IC) …
Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …
realizable complementary tool to aid optical patterning of device elements for future …
Rapid ordering of block copolymer thin films
Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be
finely tuned via block architecture and processing conditions. However, the ultimate usage …
finely tuned via block architecture and processing conditions. However, the ultimate usage …
Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library
The width and shape of 10 nm to 12 nm wide lithographically patterned SiO 2 lines were
measured in the scanning electron microscope by fitting the measured intensity vs. position …
measured in the scanning electron microscope by fitting the measured intensity vs. position …
Determining the shape and periodicity of nanostructures using small-angle x-ray scattering
The semiconductor industry is exploring new metrology techniques capable of meeting the
future requirement to characterize three-dimensional structure where the critical dimensions …
future requirement to characterize three-dimensional structure where the critical dimensions …
[KSIĄŻKA][B] Metrology and Diagnostic Techniques for Nanoelectronics
Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction
D Wack, O Khodykin, AV Shchegrov… - US Patent …, 2022 - Google Patents
Methods and systems for performing measurements of semi conductor structures based on
high-brightness, polychro matic, reflective small angle x-ray scatterometry (RSAXS) …
high-brightness, polychro matic, reflective small angle x-ray scatterometry (RSAXS) …
Characterizing morphology in organic systems with resonant soft X-ray scattering
Resonant soft X-ray scattering (R-SoXS) has proven to be a highly useful technique for
studying the morphology of soft matter thin films due to the large intrinsic contrast between …
studying the morphology of soft matter thin films due to the large intrinsic contrast between …