Mixed Hot-Carrier/Bias Temperature Instability Degradation Regimes in Full {VG, VD} Bias Space: Implications and Peculiarities

M Jech, G Rott, H Reisinger, S Tyaginov… - … on Electron Devices, 2020 - ieeexplore.ieee.org
Characterizing mixed hot-carrier/bias temperature instability (BTI) degradation in full {VG,
VD} bias space is a challenging task. Therefore, studies usually focus on individual …

Ultra-low noise defect probing instrument for defect spectroscopy of MOS transistors

M Waltl - IEEE Transactions on Device and Materials Reliability, 2020 - ieeexplore.ieee.org
It is commonly accepted that the performance and time-to-failure of modern semiconductor
transistors are seriously affected by single defects located in the insulator or at the insulator …

Impact of mixed negative bias temperature instability and hot carrier stress on MOSFET characteristics—Part I: Experimental

B Ullmann, M Jech, K Puschkarsky… - … on Electron Devices, 2018 - ieeexplore.ieee.org
Bias temperature instability (BTI) and hot-carrier degradation (HCD) are among the most
important reliability issues but are typically studied independently in an idealized setting …

Impact of mixed negative bias temperature instability and hot carrier stress on MOSFET characteristics—Part II: Theory

M Jech, B Ullmann, G Rzepa… - … on Electron Devices, 2018 - ieeexplore.ieee.org
In this paper, we examine the interplay of two serious reliability issues in MOSFET devices,
namely, bias temperature instability (BTI) and hot-carrier degradation (HCD). Most …

Understanding and modeling opposite impacts of self-heating on hot-carrier degradation in n-and p-channel transistors

S Tyaginov, A Makarov, AMB El-Sayed… - 2022 IEEE …, 2022 - ieeexplore.ieee.org
We extend our framework for hot-carrier degradation (HCD) modeling by covering the
impact of self-heating (SH) on HCD. This impact is threefold:(i) perturbation of carrier …

Combined Effect of TID Radiation and Electrical Stress on NMOSFETs

Y Cao, M Wang, X Zheng, E Zhang, L Lv, L Wang… - Micromachines, 2022 - mdpi.com
The combined effect of total ionizing dose (TID) and electrical stress is investigated on
NMOSFETs. For devices bearing both radiation and electrical stress, the threshold voltage …

On Superior Hot Carrier Robustness of Dynamically-Doped Field-Effect-Transistors

S Tyaginov, A Afzalian, A Makarov… - 2022 IEEE …, 2022 - ieeexplore.ieee.org
We simulate relative changes of the saturation drain current during hot-carrier degradation
(HCD) in dynamically-doped (D 2) and" traditional" planar complementary metal-oxide …

Hydrogen related defects in amorphous SiO2 and the negative bias temperature instability

Y Wimmer - 2017 - repositum.tuwien.at
The bias temperature instability (BTI) is a serious reliability concern in metal-oxide-
semiconductor field-effect transistors (MOSFETs). It is observed when a large voltage is …

[PDF][PDF] Mixed negative bias temperature instability and hot-carrier stress

B Ullmann - 2018 - scholar.archive.org
Bias temperature instability (BTI) and hot-carrier degradation (HCD) are among the most
important reliability issues, which affect the performance of metal-oxide-semiconductor field …

Response of switching hole traps in the small-area P-MOSFET under channel hot-hole effect

X Ju, DS Ang - 2019 IEEE International Reliability Physics …, 2019 - ieeexplore.ieee.org
This work elucidates two distinct behaviors of switching hole traps in small-area, SiON gated
p-MOSFETs subjected to channel hot-hole (CHH) effect. First, in all devices tested, the …