Apparatus and method for conformal mask manufacturing
J Scott, M Zani, M Bennahmias, M Mayse - US Patent 7,993,813, 2011 - Google Patents
4,511,980 A 4, 1985 Watanabe et al. al acturing process tec ology creates a pattern on a
4,525,629 A 6, 1985 Morita et al. first layer using a focused ion beam process. The pattern is …
4,525,629 A 6, 1985 Morita et al. first layer using a focused ion beam process. The pattern is …
Apparatus and method for controlled particle beam manufacturing
MJ Zani, MJ Bennahmias, MA Mayse… - US Patent 7,507,960, 2009 - Google Patents
(57) ABSTRACT A chamber for exposing a workpiece to charged particles includes a
charged particle source for generating a stream of charged particles, a collimator con …
charged particle source for generating a stream of charged particles, a collimator con …
Apparatus and method for controlled particle beam manufacturing
MJ Zani, MJ Bennahmias, MA Mayse… - US Patent 7,259,373, 2007 - Google Patents
(57) ABSTRACT A chamber for exposing a workpiece to charged particles includes a
charged particle source for generating a stream of charged particles, a collimator configured …
charged particle source for generating a stream of charged particles, a collimator configured …
Apparatus and method for controlled particle beam manufacturing
MJ Zani, MJ Bennahmias, MA Mayse… - US Patent 7,501,644, 2009 - Google Patents
4,383,180 4.418. 283 4,430,571 4,431,923 4,433,384 4,445,039 4,467,240 4,477,729
4,494,004 4,498,010 4,511,980 4,525,629 4,556,794 4,556,798 4,563,587 4,687,940 …
4,494,004 4,498,010 4,511,980 4,525,629 4,556,794 4,556,798 4,563,587 4,687,940 …
Multi-electrode lens optimization using genetic algorithms
N Hesam Mahmoudi Nezhad… - … Journal of Modern …, 2019 - World Scientific
In electrostatic charged particle lens design, optimization of a multi-electrode lens with many
free optimization parameters is still quite a challenge. A fully automated optimization routine …
free optimization parameters is still quite a challenge. A fully automated optimization routine …
Apparatus and method for controlled particle beam manufacturing
MJ Zani, MJ Bennahmias, MA Mayse… - US Patent 7,659,526, 2010 - Google Patents
A chamber for exposing a workpiece to charged particles includes a charged particle source
for generating a stream of charged particles, a collimator configured to collimate and direct …
for generating a stream of charged particles, a collimator configured to collimate and direct …
Apparatus and method for controlled particle beam manufacturing
MJ Zani, MJ Bennahmias, MA Mayse… - US Patent 7,488,960, 2009 - Google Patents
(57) ABSTRACT A chamber for exposing a workpiece to charged particles includes a
charged particle source for generating a stream of charged particles, a collimator con …
charged particle source for generating a stream of charged particles, a collimator con …
Apparatus and method for controlled particle beam manufacturing
MJ Zani, MJ Bennahmias, MA Mayse… - US Patent 7,495,245, 2009 - Google Patents
4,132,892 4,153,843 4,255,661 4,327,292 4,383,180 4.418. 283 4,430,571 4,431,923
4,433,384 4,445,039 4,467,240 4,477,729 4,494,004 4,498,010 4,511,980 4,525,629 …
4,433,384 4,445,039 4,467,240 4,477,729 4,494,004 4,498,010 4,511,980 4,525,629 …
Design principles of an optimized focused ion beam system
YL Wang, Z Shao - Advances in Electronics and Electron Physics, 1991 - Elsevier
Publisher Summary A generic focused ion beam (FIB) system consists of an ion source, a
condenser lens, a beam acceptance angle defining aperture, an optional ion species …
condenser lens, a beam acceptance angle defining aperture, an optional ion species …
Apparatus and method for controlled particle beam manufacturing
MJ Zani, MJ Bennahmias, MA Mayse… - US Patent 7,495,242, 2009 - Google Patents
4,383,180 4.418. 283 4,430,571 4,431,923 4,433,384 4,445,039 4,467,240 4,477,729
4,494,004 4,498,010 4,511,980 4,525,629 4,556,794 4,556,798 4,563,587 4,687,940 …
4,494,004 4,498,010 4,511,980 4,525,629 4,556,794 4,556,798 4,563,587 4,687,940 …