Physical vapor deposition is a fundamental tool to create thin films for countless
applications. Deposition at oblique vapor incidence angles can lead to the growth of thin …

The book focuses on the interaction of low-energy ions with surfaces and how these
processes affect the surface and near-surface regions of materials. These processes are of …

This study reveals that the stoichiometricity of silicon nitride thin films (SiN x-TFs)
significantly governs the packing density and water vapor transmission rate (WVTR), and it …

A qualitative model that relates the period of the surface roughness to the vertical and
spherical growth rates of glancing angle deposited (GLAD) nanorods suggests that rod self …

Amorphous silicon (Si) structures on two-dimensional arrays of seeds on a Si substrate were
experimentally prepared at near room temperature using a physical vapor deposition system …

The self-similar growth scaling of Ti O 2⁠, Si O 2⁠, and Al 2 O 3 vertical post-glancing-angle
deposited films has been characterized. Films were deposited using three deposition …

We reported the fabrication of silicon (Si) nanorods and springs on arrays of seeds with
different diameters by using glancing angle deposition technique. Single nanorod is …

The method of ion beam sputtering under glancing angle conditions in combination with an
additional rotation of the sample holder allows the growth of almost arbitrarily designed …

Nanostructured polymeric films are deposited with oblique angle polymerization of poly-p-
xylylene (PPX) derivatives. Surface and bulk characterization of nanostructured PPX films …

The anomalous dynamic scaling behavior of the d+ 1 dimensional non-local growth
equations is investigated based on the scaling approach. The growth equations studied …