High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …

High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over
the last years as it is an emerging physical vapor deposition (PVD) technology that …

The use of thin films to enhance the physical and chemical properties of materials is
ubiquitous in today's world. Examples are shown in Fig. 1: copper metallization layers for …

The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …

A new reactive ionization region model (R-IRM) is developed to describe the reactive Ar/O 2
high power impulse magnetron sputtering (HiPIMS) discharge with a titanium target. It is …

Thermochromic VO 2 windows have the potential of managing heat transfer in an efficient
way. However, several problems such as a high transition temperature~ 68° C and high …

Contrary to paradigm, magnetron discharge runaway cannot always be related to self-
sputtering. We report here that the high density discharge can be observed with all …

We systematically investigate and quantify different physical phenomena influencing the
deposition rate, a D, of Nb coatings prepared by high power impulse magnetron sputtering …

High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control
was used for high-rate reactive depositions of densified stoichiometric ZrO 2 and Ta 2 O 5 …

The origin of residual stress during film deposition is a topic of strong interest in the coating
engineering community; it requires appropriate investigation tools to explain the different …