Recent advances on multivalued logic gates: A materials perspective

SB Jo, J Kang, JH Cho - Advanced Science, 2021 - Wiley Online Library
The recent advancements in multivalued logic gates represent a rapid paradigm shift in
semiconductor technology toward a new era of hyper Moore's law. Particularly, the …

Nonvolatile memory devices based on polyimides bearing noncoplanar twisted biphenyl units containing carbazole and triphenylamine side-chain groups

YQ Li, RC Fang, AM Zheng, YY Chu, X Tao… - Journal of Materials …, 2011 - pubs.rsc.org
Two novel polyimides, PI (CzBD-BTFBPDA) and PI (TPABD-BTFBPDA), consisting of
alternating electron-donating 2, 2′-bis [4-(9H-carbazol-9-yl) phenyl]-or 2, 2′-bis [4 …

Transparent Flash Memory Using Single Ta2O5 Layer for Both Charge-Trap** and Tunneling Dielectrics

MK Hota, FH Alshammari, KN Salama… - … Applied Materials & …, 2017 - ACS Publications
We report reproducible multibit transparent flash memory in which a single solution-derived
Ta2O5 layer is used simultaneously as a charge-trap** layer and a tunneling layer. This is …

Bipolar resistive switching characteristics of poly (3, 4-ethylene-dioxythiophene): Poly (styrenesulfonate) thin film

HY Jeong, JY Kim, TH Yoon, SY Choi - Current Applied Physics, 2010 - Elsevier
We investigated the reversible resistive switching of poly (3, 4-ethylenedioxythiophene):
polystyrenesulfonate (PEDOT: PSS) thin films sandwiched between Al electrodes. The J–V …

Transition of nanocrystalline In (OH) 3 as spherical indium oxide nanoparticles embedded platelets

SK Kannan, P Thirnavukkarasu, R Jayaprakash… - Materials Science in …, 2016 - Elsevier
Indium oxide nanoparticles were synthesized by a co-precipitation method using the basic
raw materials like Indium (III) Chloride and the precipitating reagent as Ammonium …

Thickness dependence of high-k materials on the characteristics of MAHONOS structured charge trap flash memory

HW You, SM Oh, WJ Cho - Thin Solid Films, 2010 - Elsevier
The electrical characteristics of tunnel barrier engineered charge trap flash (TBE-CTF)
memory of MAHONOS (Metal/Al2O3/HfO2/SiO2/Si3N4/SiO2/Si) structure were investigated …

Electrical properties of HfO2 charge trap flash memory with SiO2/HfO2/Al2O3 engineered tunnel layer

SM Oh, H You, KS Kim, YH Lee, WJ Cho - Current Applied Physics, 2010 - Elsevier
The program/erase (P/E) characteristic of tunnel barrier engineered charge trap flash (TBE-
CTF) memory with MAHOS (Metal/Al2O3/HfO2/SiO2/Si) structure and MAHAHOS …

Critical role of top interface layer on the bipolar resistive switching of Al/PEDOT: PSS/Al memory device

JY Kim, HY Jeong, JW Kim, TH Yoon, SY Choi - Current Applied Physics, 2011 - Elsevier
The role of top interface layer in bipolar resistive switching (BRS) behaviors of Al/PEDOT:
PSS/Al memory devices was investigated via comparison with the Au/PEDOT: PSS/Al …

Resistive switching effect for ZnO hybrid memory with metal-oxide nanocrystals

DU Lee, EK Kim, WJ Cho, YH Kim, H Im - Thin Solid Films, 2012 - Elsevier
ZnO memory device with SnO2 nanocrystals embedded in a biphenyl-tertracarboxylic
dianhydride–phenylen diamine polyimide layer was fabricated, and its electrical properties …

Resistance switching properties of In2O3 nanocrystals memory device with organic and inorganic hybrid structure

DU Lee, EK Kim, WJ Cho, YH Kim - Applied Physics A, 2011 - Springer
A memory device with In 2 O 3 nanocrystals embedded in a biphenyl-tertracarboxylic
dianhydride-phenylen diamine (BPDA-PDA) polyimide layer on a ZnO layer was fabricated …