Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

This Review focuses on recent developments in the use of ZnO nanostructures for dye‐
sensitized solar cell (DSC) applications. It is shown that carefully designed and fabricated …

Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

Atomic layer controlled film growth is an important technological and scientific goal that is
closely tied to many issues in surface chemistry. This article first reviews the basic concepts …

The dependence of optical characteristics on the structure of atomic-layer-deposited titania
(TiO2) thin films is studied. Amorphous films grown at 100° C have an optical band gap of …

Nanolaminates are unique nanocomposites that allow various thin film properties to be
tuned by changing the composition and interfacial density. ZnO/Al2O3 nanolaminates allow …

Atomic layer deposition (ALD) of titanium dioxide from TiCl4 and H2O was studied at
substrate temperatures of 100–400° C. Using a real-time quartz crystal microbalance …

TiO 2 films were grown on silicon substrates by atomic layer deposition (ALD) using tetrakis-
dimethylamino titanium and ozone. Amorphous TiO 2 film was deposited at a low substrate …

Titanium dioxide thin films were grown by atomic layer deposition (ALD) at 200–400° C from
a new titanium precursor, titanium tetramethoxide, and water. As compared with other …