Lithography system
JJM Wieland, JC Van't Spijker, R Jager… - US Patent 6,958,804, 2005 - Google Patents
A maskless lithography system for transferring a pattern onto the surface of a target. At least
one beam generator for generating a plurality of beamlets. A plurality of modulators …
one beam generator for generating a plurality of beamlets. A plurality of modulators …
Lithographic apparatus, programmable patterning device and lithographic method
PWH De Jager, VY Banine, JPH Benschop… - US Patent …, 2013 - Google Patents
In an embodiment, a lithographic apparatus is disclosed that includes a modulator
configured to expose an exposure area of the substrate to a plurality of beams modulated …
configured to expose an exposure area of the substrate to a plurality of beams modulated …
Pattern generating systems
B Bi - US Patent 7,227,618, 2007 - Google Patents
A pattern generating system for generating two-dimensional images on a surface includes a
light source and one or more Zone Plate Modulator (ZPM) arrays. The ZPM arrays comprise …
light source and one or more Zone Plate Modulator (ZPM) arrays. The ZPM arrays comprise …
Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data …
PAJ Tinnemans, M Bontekoe… - US Patent 10,346,729, 2019 - Google Patents
A method for converting a vector-based representation of a desired device pattern for an
exposure apparatus, a lithography or exposure apparatus, an apparatus and method to …
exposure apparatus, a lithography or exposure apparatus, an apparatus and method to …
Lithographic apparatus, programmable patterning device and lithographic method
PWH De Jager, VY Banine, JPH Benschop… - US Patent …, 2016 - Google Patents
In an embodiment, a lithographic apparatus is disclosed that includes a modulator
configured to expose an exposure area of the substrate to a plurality of beams modulated …
configured to expose an exposure area of the substrate to a plurality of beams modulated …
Lithographic apparatus and device manufacturing method
EJ Van Zwet, PWH De Jager, J Onvlee… - US Patent …, 2015 - Google Patents
A lithographic apparatus having an optical column capable of creating a pattern on a target
portion of a substrate is disclosed. The optical column may have a self-emissive contrast …
portion of a substrate is disclosed. The optical column may have a self-emissive contrast …
Substrate handling apparatus and lithographic apparatus
J Onvlee, RHM Schmidt - US Patent 9,696,633, 2017 - Google Patents
2006, O103719 A1 2006, O108508 A1 2007.0034. 890 A1 2007, 01828O8 A1
2007/0296936 A1 2008, OO32066 A1 2008/0042969 A1 2008/0047445 A1 2008/O137051 …
2007/0296936 A1 2008, OO32066 A1 2008/0042969 A1 2008/0047445 A1 2008/O137051 …
System and method for contrast enhanced zone plate array lithography
R Menon, HI Smith - US Patent 7,667,819, 2010 - Google Patents
(57) ABSTRACT A lithography system is disclosed that includes an array of focusing
elements for directing focused illumination toward a recording medium, and a reversible …
elements for directing focused illumination toward a recording medium, and a reversible …
Optical switching in lithography system
JJM Wieland, JC van't Spijker, R Jager… - US Patent 7,173,263, 2007 - Google Patents
(57) ABSTRACT A maskless lithography system for transferring a pattern onto the surface of
a target. At least one beam generator generates a plurality of beamlets. A plurality of …
a target. At least one beam generator generates a plurality of beamlets. A plurality of …
System and method for contrast enhanced zone plate array lithography
R Menon, HI Smith - US Patent 7,666,580, 2010 - Google Patents
US7666580B2 - System and method for contrast enhanced zone plate array lithography - Google
Patents US7666580B2 - System and method for contrast enhanced zone plate array lithography …
Patents US7666580B2 - System and method for contrast enhanced zone plate array lithography …